发明申请
- 专利标题： METHOD AND MATERIAL FOR CLEANING A SUBSTRATE
- 专利标题（中）： 清洗基材的方法和材料
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申请号： US11532491申请日： 2006-09-15
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公开(公告)号： US20090308410A1公开(公告)日： 2009-12-17
- 发明人: Erik M. Freer , John M. de Larios , Katrina Mikhaylichenko , Michael Ravkin , Mikhail Korolik , Fred C. Redeker
- 申请人： Erik M. Freer , John M. de Larios , Katrina Mikhaylichenko , Michael Ravkin , Mikhail Korolik , Fred C. Redeker
- 申请人地址： US CA FREMONT
- 专利权人： LAM RESEARCH CORPORATION
- 当前专利权人： LAM RESEARCH CORPORATION
- 当前专利权人地址： US CA FREMONT
- 主分类号： C11D3/16
- IPC分类号： C11D3/16 ; B08B7/00
摘要：
Methods for cleaning using a tri-state body are disclosed. A substrate having a particle deposited thereon is provided. A tri-state body that has a solid portion, liquid portion, and a gas portion is generated. A force is applied over the tri-state body to promulgate an interaction between the solid portion and the particle. The tri-state body is removed along with the particle from the surface of the substrate. The interaction between the solid portion and the particle causing the particle to be removed along with the tri-state body.
公开/授权文献
- US07862662B2 Method and material for cleaning a substrate 公开/授权日：2011-01-04
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