公开(公告)号：US08716210B2

公开(公告)日：2014-05-06

申请号：US12948613

申请日：2010-11-17

申请人： Erik M. Freer ,  John M. de Larios ,  Katrina Mikhaylichenko ,  Michael Ravkin ,  Mikhail Korolik ,  Fred C. Redeker

发明人： Erik M. Freer ,  John M. de Larios ,  Katrina Mikhaylichenko ,  Michael Ravkin ,  Mikhail Korolik ,  Fred C. Redeker

IPC分类号： H01L21/02 ,  C11D11/00 ,  C11D17/00

CPC分类号： H01L21/02052 ,  B08B3/04 ,  B08B7/00 ,  C11D11/0047 ,  C11D17/0013 ,  C11D17/0017 ,  G03F1/82 ,  H01L21/02057 ,  H01L21/02096 ,  H01L21/67051

摘要： Material for cleaning using a tri-state body are disclosed. A substrate having a particle deposited thereon is provided. A tri-state body that has a solid portion, liquid portion, and a gas portion is generated. A force is applied over the tri-state body to promulgate an interaction between the solid portion and the particle. The tri-state body is removed along with the particle from the surface of the substrate. The interaction between the solid portion and the particle causes the particle to be removed along with the tri-state body.

摘要翻译： 公开了使用三态体进行清洁的材料。 提供了沉积有颗粒的基板。 产生具有固体部分，液体部分和气体部分的三态体。 在三态体上施加力以发出固体部分和颗粒之间的相互作用。 将三态体与来自衬底表面的颗粒一起去除。 固体部分和颗粒之间的相互作用导致颗粒与三态体一起被去除。

公开(公告)号：US08480810B2

公开(公告)日：2013-07-09

申请号：US11543365

申请日：2006-10-04

申请人： Erik M. Freer ,  John M. de Larios ,  Katrina Mikhaylichenko ,  Michael Ravkin ,  Mikhail Korolik ,  Fritz C. Redeker

发明人： Erik M. Freer ,  John M. de Larios ,  Katrina Mikhaylichenko ,  Michael Ravkin ,  Mikhail Korolik ,  Fritz C. Redeker

IPC分类号： B08B7/04

CPC分类号： B08B3/024 ,  B08B3/003 ,  B08B3/08 ,  B08B6/00 ,  H01L21/67051

摘要： A method and system for cleaning a surface, having particulate matter thereon, of a substrate features impinging upon the surface a jet of a liquid having coupling elements entrained therein. A sufficient drag force is imparted upon the coupling elements to have the same move with respect to the liquid and cause the particulate matter to move with respect to the substrate.

摘要翻译： 一种用于清洁其上具有颗粒物质的表面的表面的方法和系统，其特征在于其表面上具有夹带在其中的具有耦合元件的液体的射流。 赋予耦合元件足够的阻力以相对于液体具有相同的移动并使颗粒物质相对于基底移动。

公开(公告)号：US08011116B2

公开(公告)日：2011-09-06

申请号：US12860786

申请日：2010-08-20

申请人： Katrina Mikhaylichenko ,  Kenneth C. Dodge ,  Mikhail Korolik ,  Michael Ravkin ,  John M. de Larios ,  Fritz C. Redeker

发明人： Katrina Mikhaylichenko ,  Kenneth C. Dodge ,  Mikhail Korolik ,  Michael Ravkin ,  John M. de Larios ,  Fritz C. Redeker

IPC分类号： F26B3/34

CPC分类号： B08B3/04 ,  G03F7/30 ,  H01L21/67028 ,  H01L21/67034 ,  H01L21/67051 ,  Y10S134/902

摘要： A method is provided for removing a residual fluid remaining at a point of contact between a substrate support member and a back surface of a substrate being prepared by a proximity head. According to the method, the proximity head is applied onto the back surface of the substrate and the substrate support member being held by a carrier. The substrate support member is heated after the substrate support member passes the proximity head. The heating of the substrate support member is discontinued once the residual fluid has substantially evaporated.

摘要翻译： 提供了一种用于去除残留在衬底支撑构件和由邻近头准备的衬底的背面之间的接触点处的残余流体的方法。 根据该方法，将接近头部施加到基板的背面，并且基板支撑构件被载体保持。 在衬底支撑构件通过邻近头之后，加热衬底支撑构件。 一旦残留的流体基本上蒸发，衬底支撑构件的加热就会停止。

公开(公告)号：US20110183522A1

公开(公告)日：2011-07-28

申请号：US12694134

申请日：2010-01-26

申请人： Katrina Mikhaylichenko ,  Denis Syomin ,  Qian Fu ,  Glenn W. Gale ,  Shenjian Liu ,  Mark H. Wilcoxson

发明人： Katrina Mikhaylichenko ,  Denis Syomin ,  Qian Fu ,  Glenn W. Gale ,  Shenjian Liu ,  Mark H. Wilcoxson

IPC分类号： H01L21/306 ,  H01L21/3065

CPC分类号： H01L21/31116 ,  H01L21/0206 ,  H01L21/02068 ,  H01L21/3081 ,  H01L21/31111

摘要： A method is provided for processing a wafer used in fabricating semiconductor devices. The method can comprise forming high-aspect ratio features on the wafer, which is followed by wet processing and drying. During drying, pattern collapse can occur. This pattern collapse can be repaired to allow for additional processing of the wafer. In some instance, pattern collapse can be repaired via etching where the etching breaks bonds that can have formed during pattern collapse.

摘要翻译： 提供了一种用于处理在制造半导体器件中使用的晶片的方法。 该方法可以包括在晶片上形成高纵横比特征，其后是湿加工和干燥。 在干燥期间，可能发生图案塌陷。 可以修复该图案崩溃以允许对晶片进行额外的处理。 在某些情况下，可以通过蚀刻来修复图案塌陷，其中蚀刻破坏在图案崩溃期间可能形成的键。

公开(公告)号：US20110065621A1

公开(公告)日：2011-03-17

申请号：US12948613

申请日：2010-11-17

申请人： Erik M. Freer ,  John M. de Larios ,  Katrina Mikhaylichenko ,  Michael Ravkin ,  Mikhail Korolik ,  Fred C. Redeker

发明人： Erik M. Freer ,  John M. de Larios ,  Katrina Mikhaylichenko ,  Michael Ravkin ,  Mikhail Korolik ,  Fred C. Redeker

IPC分类号： C11D17/00

CPC分类号： H01L21/02052 ,  B08B3/04 ,  B08B7/00 ,  C11D11/0047 ,  C11D17/0013 ,  C11D17/0017 ,  G03F1/82 ,  H01L21/02057 ,  H01L21/02096 ,  H01L21/67051

摘要： Material for cleaning using a tri-state body are disclosed. A substrate having a particle deposited thereon is provided. A tri-state body that has a solid portion, liquid portion, and a gas portion is generated. A force is applied over the tri-state body to promulgate an interaction between the solid portion and the particle. The tri-state body is removed along with the particle from the surface of the substrate. The interaction between the solid portion and the particle causes the particle to be removed along with the tri-state body.

摘要翻译： 公开了使用三态体进行清洁的材料。 提供了沉积有颗粒的基板。 产生具有固体部分，液体部分和气体部分的三态体。 在三态体上施加力以发出固体部分和颗粒之间的相互作用。 将三态体与来自衬底表面的颗粒一起除去。 固体部分和颗粒之间的相互作用导致颗粒与三态体一起被去除。

公开(公告)号：US07799141B2

公开(公告)日：2010-09-21

申请号：US11519354

申请日：2006-09-11

申请人： Mikhail Korolik ,  Erik M. Freer ,  John M. de Larios ,  Katrina Mikhaylichenko ,  Mike Ravkin ,  Fritz Redeker

发明人： Mikhail Korolik ,  Erik M. Freer ,  John M. de Larios ,  Katrina Mikhaylichenko ,  Mike Ravkin ,  Fritz Redeker

IPC分类号： B08B7/00

CPC分类号： C11D11/0047 ,  B08B7/02 ,  C11D1/146 ,  C11D3/2079 ,  C11D9/02 ,  C11D17/0013 ,  C11D17/0017 ,  C23G1/18 ,  G03F7/423 ,  H01L21/02052 ,  H01L21/31133 ,  H01L21/6708 ,  H01L21/67086

摘要： Cleaning compounds, apparatus, and methods to remove contaminants from a substrate surface are provided. An exemplary cleaning compound to remove particulate contaminants from a semiconductor substrate surface is provided. The cleaning compound includes a viscous liquid with a viscosity between about 1 cP to about 10,000 cP. The cleaning compound also includes a plurality of solid components dispersed in the viscous liquid, the plurality of solid components interact with the particulate contaminants on the substrate surface to remove the particulate contaminants from the substrate surface.

摘要翻译： 提供了清除化合物，设备和从基材表面除去污染物的方法。 提供了从半导体衬底表面去除颗粒污染物的示例性清洁化合物。 清洁化合物包括粘度在约1cP至约10,000cP之间的粘性液体。 清洁化合物还包括分散在粘性液体中的多个固体组分，多个固体组分与基底表面上的颗粒污染物相互作用以从基底表面去除颗粒污染物。

公开(公告)号：US20100018553A1

公开(公告)日：2010-01-28

申请号：US12212559

申请日：2008-09-17

申请人： Katrina Mikhaylichenko ,  Yizhak Sabba ,  Dragan Podlesnik

发明人： Katrina Mikhaylichenko ,  Yizhak Sabba ,  Dragan Podlesnik

IPC分类号： B08B7/04 ,  B08B13/00

CPC分类号： H01L21/67051 ,  H01L21/02071 ,  H01L21/6704 ,  H01L21/67075 ,  H01L21/67253 ,  H01L22/12 ,  H01L22/20

摘要： A system and method for removing polymer residue from around a metal gate structure formed on a surface of a substrate during a post-etch cleaning operation includes determining a plurality of process parameters associated with the metal gate structure and the polymer residue to be removed. A plurality of fabrication layers define the metal gate structure and the process parameters define characteristics of the fabrication layers and the polymer residue. A first cleaning chemistry and second cleaning chemistry are identified and a plurality of application parameters associated with the first and second cleaning chemistries are defined based on the process parameters. The first and second application chemistries are applied sequentially in a controlled manner using the application parameters to substantial remove the polymer residue while preserving the structural integrity of the gate structure.

摘要翻译： 在蚀刻前清洁操作期间从形成在基板的表面上的金属栅极结构周围除去聚合物残留物的系统和方法包括确定与金属栅极结构和待除去的聚合物残余物相关联的多个工艺参数。 多个制造层限定了金属栅极结构，并且工艺参数限定了制造层和聚合物残余物的特性。 识别第一清洁化学品和第二清洁化学品，并且基于过程参数来定义与第一和第二清洁化学品相关联的多个施用参数。 使用应用参数以受控的方式顺序施加第一和第二施用化学物质，以显着除去聚合物残余物，同时保持栅极结构的结构完整性。

公开(公告)号：US07648584B2

公开(公告)日：2010-01-19

申请号：US11336215

申请日：2006-01-20

申请人： Erik M. Freer ,  John M. de Larios ,  Katrina Mikhaylichenko ,  Michael Ravkin ,  Mikhail Korolik ,  Fred C. Redeker ,  Clint Thomas ,  John Parks

发明人： Erik M. Freer ,  John M. de Larios ,  Katrina Mikhaylichenko ,  Michael Ravkin ,  Mikhail Korolik ,  Fred C. Redeker ,  Clint Thomas ,  John Parks

IPC分类号： B08B7/00

CPC分类号： H01L21/02057 ,  B05D3/10 ,  B08B7/02 ,  C11D1/04 ,  C11D3/042 ,  C11D3/044 ,  C11D3/18 ,  C11D3/2079 ,  C11D3/222 ,  C11D3/225 ,  C11D3/3765 ,  C11D9/00 ,  C11D9/02 ,  C11D9/267 ,  C11D11/0047 ,  C11D17/0004 ,  C11D17/0013 ,  C11D17/0017 ,  C11D17/003 ,  C11D17/041 ,  C23G1/00 ,  C23G1/18 ,  G03F7/42 ,  G03F7/423 ,  H01L21/02052 ,  H01L21/02096 ,  H01L21/31133 ,  H01L21/67051 ,  H01L21/67057 ,  H01L21/6708 ,  H01L21/67086

摘要： A cleaning material is disposed over a substrate. The cleaning material includes solid components dispersed within a liquid medium. A force is applied to the solid components within the liquid medium to bring the solid components within proximity to contaminants present on the substrate. The force applied to the solid components can be exerted by an immiscible component within the liquid medium. When the solid components are brought within sufficient proximity to the contaminants, an interaction is established between the solid components and the contaminants. Then, the solid components are moved away from the substrate such that the contaminants having interacted with the solid components are removed from the substrate.

摘要翻译： 清洁材料设置在基板上。 清洁材料包括分散在液体介质中的固体组分。 将力施加到液体介质中的固体组分以使固体组分接近存在于基底上的污染物。 施加到固体组分的力可以通过液体介质中的不混溶组分施加。 当固体组分被充分接近污染物时，在固体组分和污染物之间建立了相互作用。 然后，将固体组分从衬底移开，使得与固体组分相互作用的污染物从衬底上除去。

公开(公告)号：US20090308413A1

公开(公告)日：2009-12-17

申请号：US11532493

申请日：2006-09-15

申请人： Erik M. Freer ,  John M. de Larios ,  Katrina Mikhaylichenko ,  Michael Ravkin ,  Mikhail Korolik ,  Fred C. Redeker ,  Clint Thomas ,  John Parks

发明人： Erik M. Freer ,  John M. de Larios ,  Katrina Mikhaylichenko ,  Michael Ravkin ,  Mikhail Korolik ,  Fred C. Redeker ,  Clint Thomas ,  John Parks

IPC分类号： B08B3/08

CPC分类号： H01L21/67051 ,  B08B3/003 ,  B08B3/02

摘要： An apparatus for cleaning a substrate is disclosed. The apparatus having a first head unit and a second head unit. The first head unit is positioned proximate to the surface of the substrate and has a first row of channels defined within configured to supply a foam to the surface of the substrate. The second head unit is positioned substantially adjacent to the first head unit and proximate to the surface of the substrate. A second and a third row of channels are defined within the second head unit. The second row of channels is configured to supply a fluid to the surface of the substrate. The third row of channels is configured to apply a vacuum to the surface of the substrate.

摘要翻译： 公开了一种用于清洁衬底的设备。 该装置具有第一头单元和第二头单元。 第一头单元定位成接近基底的表面，并且具有限定在构造成向基底的表面提供泡沫的第一排通道。 第二头单元被定位成基本上与第一头单元相邻并且靠近衬底的表面。 第二和第三行通道被限定在第二头单元内。 第二排通道被配置成向衬底的表面提供流体。 第三排通道被配置为向基板的表面施加真空。

公开(公告)号：US20090114249A1

公开(公告)日：2009-05-07

申请号：US11704435

申请日：2007-02-08

申请人： Katrina Mikhaylichenko ,  Mike Ravkin ,  Fritz Redeker ,  John M. de Larios ,  Erik M. Freer ,  Mikhail Korolik

发明人： Katrina Mikhaylichenko ,  Mike Ravkin ,  Fritz Redeker ,  John M. de Larios ,  Erik M. Freer ,  Mikhail Korolik

IPC分类号： B08B3/04

CPC分类号： H01L21/02057 ,  C25D5/34 ,  C25D7/12 ,  H01L21/288 ,  H01L21/67051 ,  H01L21/67057 ,  H01L21/6708 ,  H01L21/67086 ,  H01L21/76841

摘要： An apparatus, system and method for preparing a surface of a substrate using a proximity head includes applying a non-Newtonian fluid between the surface of the substrate and a head surface of the proximity head. The non-Newtonian fluid defines a containment wall along one or more sides between the head surface and the surface of the substrate. The one or more sides provided with the non-Newtonian fluid define a treatment region on the substrate between the head surface and the surface of the substrate. A Newtonian fluid is applied to the surface of the substrate through the proximity head, such that the applied Newtonian fluid is substantially contained in the treatment region defined by the containment wall. The contained Newtonian fluid aids in the removal of one or more contaminants from the surface of the substrate. In one example, the non-Newtonian fluid can also be used to create ambient controlled isolated regions, which can assist in controlled processing of surfaces within the regions. In an alternate example, a second non-Newtonian fluid is applied to the treatment region instead of the Newtonian fluid. The second non-Newtonian fluid acts on one or more contaminants on the surface of the substrate substantially removing them from the surface of the substrate.

摘要翻译： 使用接近头来制备基底的表面的装置，系统和方法包括在基底的表面和邻近头的头表面之间施加非牛顿流体。 非牛顿流体在头表面和基底表面之间沿着一个或多个侧面限定了容纳壁。 设置有非牛顿流体的一个或多个侧面限定了头表面和基底表面之间的基底上的处理区域。 通过邻近头将牛顿流体施加到基底的表面，使得所施加的牛顿流体基本上包含在由容纳壁限定的处理区域中。 所含的牛顿流体有助于从基底表面去除一种或多种污染物。 在一个示例中，非牛顿流体也可以用于创建环境控制的隔离区域，这可以有助于区域内的表面的受控处理。 在替代示例中，将第二非牛顿流体施加到处理区域而不是牛顿流体。 第二非牛顿流体作用于衬底表面上的一种或多种污染物，基本上将其从衬底的表面上除去。