发明申请
US20090317540A1 Methods Of Forming A Non-Volatile Resistive Oxide Memory Array
有权
形成非易失性电阻氧化物记忆阵列的方法
- 专利标题: Methods Of Forming A Non-Volatile Resistive Oxide Memory Array
- 专利标题(中): 形成非易失性电阻氧化物记忆阵列的方法
-
申请号: US12141559申请日: 2008-06-18
-
公开(公告)号: US20090317540A1公开(公告)日: 2009-12-24
- 发明人: Gurtej Sandhu , John Smythe , Bhaskar Srinivasan
- 申请人: Gurtej Sandhu , John Smythe , Bhaskar Srinivasan
- 主分类号: B05D5/12
- IPC分类号: B05D5/12
摘要:
A method of forming a non-volatile resistive oxide memory array includes forming a plurality of one of conductive word lines or conductive bit lines over a substrate. Metal oxide-comprising material is formed over the plurality of said one of the word lines or bit lines. A series of elongated trenches is provided over the plurality of said one of the word lines or bit lines. A plurality of self-assembled block copolymer lines is formed within individual of the trenches in registered alignment with and between the trench sidewalls. A plurality of the other of conductive word lines or conductive bit lines is provided from said plurality of self-assembled block copolymer lines to form individually programmable junctions comprising said metal oxide-comprising material where the word lines and bit lines cross one another.
公开/授权文献
信息查询