发明申请
US20090321769A1 METHOD FOR COATING SEMICONDUCTOR DEVICE USING DROPLET DEPOSITION 有权
使用浸渍沉积法涂覆半导体器件的方法

METHOD FOR COATING SEMICONDUCTOR DEVICE USING DROPLET DEPOSITION
摘要:
Methods and systems for coating of semiconductor devices using droplets of wavelength conversion or phosphor particles in a liquid medium. A plurality of nozzles delivers a controlled amount of the matrix material to the surface of the semiconductor device, with each of said nozzles having an opening for the matrix material to pass. The opening has a diameter wherein the diameter of the phosphor particles is less than or approximately equal to one half the diameter of the opening. The phosphor particles are also substantially spherical or rounded. The nozzles are typically arranged on a print head that utilizes jet printing techniques to cover the semiconductor device with a layer of the matrix material. The methods and systems are particularly applicable to covering LEDs with a layer of phosphor materials.
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