发明申请
- 专利标题： LITHOGRAPHIC APPARATUS
- 专利标题（中）： LITHOGRAPHIC设备
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申请号： US12484812申请日： 2009-06-15
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公开(公告)号： US20100002211A1公开(公告)日： 2010-01-07
- 发明人: Denis GLUSHKOV , Vadim Yevgenyevich BANINE , Vladimir Vitalevich IVANOV , Konstantin Nikolaevich KOSHELEV , Givi Georgievich ZUKAKISHVILI , Vladimir Mihailovitch KRIVTSUN , Yurii Victorovitch SIDELNIKOV , Kurt GIELISSEN , Oleg YAKUSHEV
- 申请人： Denis GLUSHKOV , Vadim Yevgenyevich BANINE , Vladimir Vitalevich IVANOV , Konstantin Nikolaevich KOSHELEV , Givi Georgievich ZUKAKISHVILI , Vladimir Mihailovitch KRIVTSUN , Yurii Victorovitch SIDELNIKOV , Kurt GIELISSEN , Oleg YAKUSHEV
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： G03B27/42
- IPC分类号： G03B27/42 ; B01J19/08
摘要：
A discharge produced plasma radiation source includes a laser beam pulse generator configured to provide a laser beam pulse to trigger a pinch in a plasma of the discharge produced plasma radiation source. The laser beam pulse generator is arranged to provide a laser beam pulse having an energy greater than an optimum laser beam pulse energy that corresponds to a maximum output of a given wavelength of radiation for a given discharge energy.
公开/授权文献
- US09307624B2 Lithographic apparatus 公开/授权日：2016-04-05
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