公开(公告)号：US20110013167A1

公开(公告)日：2011-01-20

申请号：US12890256

申请日：2010-09-24

申请人： Vladimir Mihailovitch KRIVTSUN ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Evgeny Dmitrievich Korop ,  Konstantin Nikolaevich Koshelev ,  Yurii Victorovitch Sidelnikov ,  Oleg Yakushev

发明人： Vladimir Mihailovitch KRIVTSUN ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Evgeny Dmitrievich Korop ,  Konstantin Nikolaevich Koshelev ,  Yurii Victorovitch Sidelnikov ,  Oleg Yakushev

IPC分类号： G03B27/54 ,  H01J3/14 ,  G03B27/42

CPC分类号： G03F7/70916 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70858 ,  G03F7/70883 ,  G03F7/70983

摘要： An apparatus for forming a beam of electromagnetic radiation. The apparatus includes a plasma radiation source, a foil trap provided with a plurality of thin foils that extend substantially parallel to the direction of radiation from the plasma source, and a grid disposed between the plasma radiation source and the foil trap. A space is located between the grid and the foil trap. An electrical potential application circuit is constructed and arranged to apply an electrical potential to the grid so that the grid repels electrons emitted by the plasma radiation source and creates a positive space charge between the grid and the foil trap to deflect ions emitted by the plasma radiation source to the foil trap. A distance between the grid and the foil trap is at least equal to one-half of a radius of the foil trap.

摘要翻译： 一种用于形成电磁辐射束的装置。 该装置包括等离子体辐射源，设置有基本上平行于来自等离子体源的辐射方向延伸的多个薄箔的箔陷阱以及设置在等离子体辐射源和箔捕获器之间的栅格。 一个空间位于网格和箔陷阱之间。 构造并布置电位施加电路以向电网施加电势，使得电网排斥由等离子体辐射源发射的电子，并在栅格和箔陷阱之间产生正空间电荷，以偏转由等离子体辐射发射的离子 来源于箔陷阱。 栅格和箔阱之间的距离至少等于箔阱的半径的一半。

公开(公告)号：US07034308B2

公开(公告)日：2006-04-25

申请号：US10873646

申请日：2004-06-23

申请人： Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Ralph Kurt ,  Frank Jeroen Pieter Schuurmans ,  Yurii Victorovitch Sidelnikov

发明人： Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Ralph Kurt ,  Frank Jeroen Pieter Schuurmans ,  Yurii Victorovitch Sidelnikov

IPC分类号： G21G5/00 ,  G03F7/20 ,  G03B27/52

CPC分类号： G03F7/70916

摘要： A radiation system includes a contamination barrier, e.g., a foil trap, between a collector, for example a normal incidence collector, and a radiation source, such that radiation coming from the source passes the foil trap twice. The radiation passes the contamination barrier once before hitting the collector and a second time after reflection by the collector. The foil trap includes lamellas that are parallel to both the radiation coming from the light source, and to the radiation reflected by the collector. The radiation is thus not obstructed by the foil trap. In this way, a normal incidence collector, which is used with a plasma produced source, can be protected from debris coming from a EUV source.

摘要翻译： 辐射系统包括在收集器例如正入射收集器和辐射源之间的污染屏障，例如箔阱，使得来自源的辐射通过箔阱两次。 辐射在撞击收集器之前通过污染屏障一次，并在收集器反射之后经过第二次。 箔捕获器包括平行于来自光源的辐射和由收集器反射的辐射的片层。 因此辐射不被箔陷阱阻挡。 以这种方式，可以保护与等离子体产生的源一起使用的正常入射收集器免受来自EUV源的碎片。

公开(公告)号：US20100002211A1

公开(公告)日：2010-01-07

申请号：US12484812

申请日：2009-06-15

申请人： Denis GLUSHKOV ,  Vadim Yevgenyevich BANINE ,  Vladimir Vitalevich IVANOV ,  Konstantin Nikolaevich KOSHELEV ,  Givi Georgievich ZUKAKISHVILI ,  Vladimir Mihailovitch KRIVTSUN ,  Yurii Victorovitch SIDELNIKOV ,  Kurt GIELISSEN ,  Oleg YAKUSHEV

发明人： Denis GLUSHKOV ,  Vadim Yevgenyevich BANINE ,  Vladimir Vitalevich IVANOV ,  Konstantin Nikolaevich KOSHELEV ,  Givi Georgievich ZUKAKISHVILI ,  Vladimir Mihailovitch KRIVTSUN ,  Yurii Victorovitch SIDELNIKOV ,  Kurt GIELISSEN ,  Oleg YAKUSHEV

IPC分类号： G03B27/42 ,  B01J19/08

CPC分类号： H05G2/003 ,  G03F7/70033 ,  H05G2/008

摘要： A discharge produced plasma radiation source includes a laser beam pulse generator configured to provide a laser beam pulse to trigger a pinch in a plasma of the discharge produced plasma radiation source. The laser beam pulse generator is arranged to provide a laser beam pulse having an energy greater than an optimum laser beam pulse energy that corresponds to a maximum output of a given wavelength of radiation for a given discharge energy.

摘要翻译： 放电产生的等离子体辐射源包括激光束脉冲发生器，其被配置为提供激光束脉冲以触发放电产生的等离子体辐射源的等离子体中的夹点。 激光束脉冲发生器被布置成提供具有大于对于给定放电能量的给定波长的辐射的最大输出的最佳激光束脉冲能量的能量的激光束脉冲。

公开(公告)号：US09307624B2

公开(公告)日：2016-04-05

申请号：US12484812

申请日：2009-06-15

申请人： Denis Alexandrovich Glushkov ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Konstantin Nikolaevich Koshelev ,  Givi Georgievich Zukakishvili ,  Vladimir Mihailovitch Krivtsun ,  Yurii Victorovitch Sidelnikov ,  Kurt Gielissen ,  Oleg Yakushev

发明人： Denis Alexandrovich Glushkov ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Konstantin Nikolaevich Koshelev ,  Givi Georgievich Zukakishvili ,  Vladimir Mihailovitch Krivtsun ,  Yurii Victorovitch Sidelnikov ,  Kurt Gielissen ,  Oleg Yakushev

IPC分类号： G21K5/04 ,  H05G2/00 ,  G03F7/20

CPC分类号： H05G2/003 ,  G03F7/70033 ,  H05G2/008

摘要： A discharge produced plasma radiation source includes a laser beam pulse generator configured to provide a laser beam pulse to trigger a pinch in a plasma of the discharge produced plasma radiation source. The laser beam pulse generator is arranged to provide a laser beam pulse having an energy greater than an optimum laser beam pulse energy that corresponds to a maximum output of a given wavelength of radiation for a given discharge energy.

摘要翻译： 放电产生的等离子体辐射源包括激光束脉冲发生器，其被配置为提供激光束脉冲以触发放电产生的等离子体辐射源的等离子体中的夹点。 激光束脉冲发生器被布置成提供具有大于对于给定放电能量的给定波长的辐射的最大输出的最佳激光束脉冲能量的能量的激光束脉冲。

公开(公告)号：US08294128B2

公开(公告)日：2012-10-23

申请号：US12890256

申请日：2010-09-24

申请人： Vladimir Mihailovitch Krivtsun ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Evgeny Dmitrievich Korop ,  Konstantin Nikolaevich Koshelev ,  Yurii Victorovitch Sidelnikov ,  Oleg Yakushev

发明人： Vladimir Mihailovitch Krivtsun ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Evgeny Dmitrievich Korop ,  Konstantin Nikolaevich Koshelev ,  Yurii Victorovitch Sidelnikov ,  Oleg Yakushev

IPC分类号： G03B27/42

CPC分类号： G03F7/70916 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70858 ,  G03F7/70883 ,  G03F7/70983

摘要： An apparatus for forming a beam of electromagnetic radiation. The apparatus includes a plasma radiation source, a foil trap provided with a plurality of thin foils that extend substantially parallel to the direction of radiation from the plasma source, and a grid disposed between the plasma radiation source and the foil trap. A space is located between the grid and the foil trap. An electrical potential application circuit is constructed and arranged to apply an electrical potential to the grid so that the grid repels electrons emitted by the plasma radiation source and creates a positive space charge between the grid and the foil trap to deflect ions emitted by the plasma radiation source to the foil trap. A distance between the grid and the foil trap is at least equal to one-half of a radius of the foil trap.

摘要翻译： 一种用于形成电磁辐射束的装置。 该装置包括等离子体辐射源，设置有基本上平行于来自等离子体源的辐射方向延伸的多个薄箔的箔陷阱以及设置在等离子体辐射源和箔捕获器之间的栅格。 一个空间位于网格和箔陷阱之间。 构造并布置电位施加电路以向电网施加电势，使得电网排斥由等离子体辐射源发射的电子，并在栅格和箔陷阱之间产生正空间电荷，以偏转由等离子体辐射发射的离子 来源于箔陷阱。 栅格和箔阱之间的距离至少等于箔阱的半径的一半。

公开(公告)号：US07825390B2

公开(公告)日：2010-11-02

申请号：US11705822

申请日：2007-02-14

申请人： Vladimir Mihallovitch Krivtsun ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Evgeny Dmitrievich Korop ,  Konstantin Nikolaevich Koshelev ,  Yurii Victorovitch Sidelnikov ,  Oleg Yakushev

发明人： Vladimir Mihallovitch Krivtsun ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Evgeny Dmitrievich Korop ,  Konstantin Nikolaevich Koshelev ,  Yurii Victorovitch Sidelnikov ,  Oleg Yakushev

IPC分类号： G03B27/42

CPC分类号： G03F7/70916 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70858 ,  G03F7/70883 ,  G03F7/70983

摘要： An apparatus for forming a beam of electromagnetic radiation includes a plasma radiation source, and a foil trap provided with a plurality of thin foils that extend substantially parallel to the direction of radiation from the plasma source. A grid is disposed between the plasma radiation source and the foil trap. A space is located between the grid and the foil trap. The apparatus also include an electrical potential application circuit that is constructed and arranged to apply an electrical potential to the grid so that the grid repels electrons emitted by the plasma radiation source and creates a positive space charge between the grid and the foil trap to deflect ions emitted by the plasma radiation source to the foil trap.

摘要翻译： 用于形成电磁辐射束的装置包括等离子体辐射源和设置有大致平行于来自等离子体源的辐射方向延伸的多个薄箔的箔阱。 栅格设置在等离子体辐射源和箔阱之间。 一个空间位于网格和箔陷阱之间。 该装置还包括电位施加电路，其构造和布置成向电网施加电势，使得电网排斥由等离子体辐射源发射的电子，并在栅格和箔陷阱之间产生正空间电荷以偏转离子 由等离子体辐射源发射到箔阱。

公开(公告)号：US20130070218A1

公开(公告)日：2013-03-21

申请号：US13580364

申请日：2011-03-03

申请人： Vladimir Vitalevich Ivanov ,  Pavel Stanislavovich Antsiferov ,  Yurii Victorovitch Sidelnikov ,  Luigi Scaccabarozzi ,  Hendrik Antony Johannes Neerhof ,  Andrei Mikhailovich Yakunin ,  Erik Roelof Loopstra ,  Vadim Yevgenyevich Banine ,  Richard Joseph Bruls

发明人： Vladimir Vitalevich Ivanov ,  Pavel Stanislavovich Antsiferov ,  Yurii Victorovitch Sidelnikov ,  Luigi Scaccabarozzi ,  Hendrik Antony Johannes Neerhof ,  Andrei Mikhailovich Yakunin ,  Erik Roelof Loopstra ,  Vadim Yevgenyevich Banine ,  Richard Joseph Bruls

IPC分类号： G03B27/52 ,  C23F1/08

CPC分类号： G03F7/70916

摘要： A system for removing contaminant particles from the path of the beam of EUV radiation is provided in which at least a first AC voltage is provided to a pair of electrodes on opposite sides of the path of the beam of EUV radiation as a first stage of a regime of voltages and, as a second stage of the regime of voltages, a DC voltage is provided to the electrodes.

摘要翻译： 提供了一种用于从EUV辐射束的路径去除污染物颗粒的系统，其中至少第一AC电压被提供给EUV辐射束的路径的相对侧上的一对电极，作为第一级 作为电压状态的第二阶段，向电极提供直流电压。

公开(公告)号：US08018574B2

公开(公告)日：2011-09-13

申请号：US11170788

申请日：2005-06-30

申请人： Robert Rafilevitch Gayazov ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Evgenii Dmitreevitch Korob ,  Konstantin Nikolaevitch Koshelev ,  Givi Georgievitch Zukavishvili ,  Yurii Victorovitch Sidelnikov

发明人： Robert Rafilevitch Gayazov ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Evgenii Dmitreevitch Korob ,  Konstantin Nikolaevitch Koshelev ,  Givi Georgievitch Zukavishvili ,  Yurii Victorovitch Sidelnikov

IPC分类号： G03B27/42

CPC分类号： G03F7/70916

摘要： A foil trap is located in a path of a radiation beam. The foil trap includes an array of conductive strips. A voltage application circuit is coupled to the strips to apply voltage differences between pairs of adjacent ones of the strips. The voltage application circuit includes a current limiting circuit arranged to limit currents to the strips to values below a threshold value above which self-sustained arc discharge may arise in the foil trap.

摘要翻译： 箔陷阱位于辐射束的路径中。 箔阱包括导电条的阵列。 电压施加电路耦合到条带以在相邻条带之间施加电压差。 电压施加电路包括限流电路，其被布置为将电流限制到条带以下的值到低于阈值的值，在该阈值以上可能在箔阱中产生自持电弧放电。

公开(公告)号：US07928412B2

公开(公告)日：2011-04-19

申请号：US12405831

申请日：2009-03-17

申请人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Johannes Peterus Henricus De Kuster ,  Johannes Hubertus Josephina Moors ,  Lucas Henricus Johannes Stevens ,  Bastiaan Theodoor Wolschrijn ,  Yurii Victorovitch Sidelnikov ,  Marc Hubertus Lorenz Van der Velden ,  Wouter Anthon Soer ,  Thomas Stein ,  Kurt Gielissen

发明人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Johannes Peterus Henricus De Kuster ,  Johannes Hubertus Josephina Moors ,  Lucas Henricus Johannes Stevens ,  Bastiaan Theodoor Wolschrijn ,  Yurii Victorovitch Sidelnikov ,  Marc Hubertus Lorenz Van der Velden ,  Wouter Anthon Soer ,  Thomas Stein ,  Kurt Gielissen

IPC分类号： G21K5/00

CPC分类号： G03F7/70925 ,  G03F7/7085 ,  G03F7/70908 ,  G03F7/70916

摘要： A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.

摘要翻译： 公开了一种被配置为将图案化的辐射束投影到基板的目标部分上的光刻设备。 该装置包括第一辐射剂量检测器和第二辐射剂量检测器，每个检测器包括被配置为接收辐射通量并由于接收到辐射通量而发射二次电子的二次电子发射表面，位于上游的第一辐射剂量检测器 相对于相对于辐射传播方向观察的第二辐射剂量检测器，以及连接到每个检测器的仪表，以检测由相应的电子发射表面产生的二次电子发射产生的电流或电压。

公开(公告)号：US20110020752A1

公开(公告)日：2011-01-27

申请号：US12810636

申请日：2008-12-19

申请人： Yurii Victorovitch Sidelnikov ,  Vadim Yevgenyevich Banine ,  Konstantin Nikolaevich Koshelev ,  Vladimir Mihailovitch Krivtsun

发明人： Yurii Victorovitch Sidelnikov ,  Vadim Yevgenyevich Banine ,  Konstantin Nikolaevich Koshelev ,  Vladimir Mihailovitch Krivtsun

IPC分类号： G03F7/20 ,  H05G2/00 ,  G03B27/54

CPC分类号： H05G2/003

摘要： A radiation source is constructed and arranged to produce extreme ultraviolet radiation. The radiation source includes a chamber, a first electrode at least partially contained in the chamber, a second electrode at least partially contained in the chamber, and a supply constructed and arranged to provide a discharge gas to the chamber. The first electrode and the second electrode are configured to create a discharge in the discharge gas to form a plasma so as to generate the extreme ultraviolet radiation. The source also includes a gas supply constructed and arranged to provide a gas at a partial pressure between about 1 Pa and about 10 Pa at a location near the discharge. The gas is selected from the group consisting of hydrogen, helium, and a mixture of hydrogen and helium.

摘要翻译： 辐射源被构造和布置成产生极紫外辐射。 辐射源包括腔室，至少部分地容纳在腔室中的第一电极，至少部分地容纳在腔室中的第二电极，以及构造和布置成向腔室提供放电气体的供应源。 第一电极和第二电极被配置为在放电气体中产生放电以形成等离子体，以产生极紫外辐射。 源还包括构造和布置成在靠近放电的位置处提供在约1Pa和约10Pa之间的分压的气体的气体供应。 气体选自氢，氦和氢和氦的混合物。