发明申请
- 专利标题: METHOD FOR TREATMENT OF SAMPLES FOR TRANSMISSION ELECTRONIC MICROSCOPES
- 专利标题(中): 用于处理传输电子显微镜样品的方法
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申请号: US12258965申请日: 2008-10-27
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公开(公告)号: US20100006754A1公开(公告)日: 2010-01-14
- 发明人: Qi Hua Zhang , Chorng Shyr Niou , Pan Liu , Ming Li
- 申请人: Qi Hua Zhang , Chorng Shyr Niou , Pan Liu , Ming Li
- 申请人地址: CN Shanghai
- 专利权人: Semiconductor Manufacturing International (Shanghai) Corporation
- 当前专利权人: Semiconductor Manufacturing International (Shanghai) Corporation
- 当前专利权人地址: CN Shanghai
- 优先权: CN200810040369.X 20080708
- 主分类号: G01N23/00
- IPC分类号: G01N23/00
摘要:
A method for analyzing a sample for the manufacture of integrated circuits, e.g., dynamic random access memory device, commonly called, DRAMS. The method also provides an integrated chip including a thickness, a width, and a length. In a specific embodiment, the integrated chip has at least one elongated structure through a portion of the thickness, while being normal to the width and the length. In a specific embodiment, the elongated structure has a structure width and a structure length that extends through a vertical portion of the thickness. The method includes removing a slice of the integrated circuit chip from a portion of the thickness in a directional manner normal to the structure length. In a specific embodiment, the slice is provided through an entirety of the one elongated structure along the structure length to cause a portion of a thickness of the slice providing the elongated structure to be of a substantially uniform sample thickness. The method also includes capturing one or more images through a portion of the slice using a transmission electron
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