发明申请
US20100007028A1 DEVICE INCLUDING AN IMIDE LAYER WITH NON-CONTACT OPENINGS AND METHOD
审中-公开
包括非接触开口和方法的第一层的装置
- 专利标题: DEVICE INCLUDING AN IMIDE LAYER WITH NON-CONTACT OPENINGS AND METHOD
- 专利标题(中): 包括非接触开口和方法的第一层的装置
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申请号: US12171799申请日: 2008-07-11
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公开(公告)号: US20100007028A1公开(公告)日: 2010-01-14
- 发明人: Christian Fachmann , Christoph Ungermanns , Stefan Gamerith , Michael Fuchs
- 申请人: Christian Fachmann , Christoph Ungermanns , Stefan Gamerith , Michael Fuchs
- 申请人地址: AT Villach
- 专利权人: Infineon Technologies Austria AG
- 当前专利权人: Infineon Technologies Austria AG
- 当前专利权人地址: AT Villach
- 主分类号: H01L23/48
- IPC分类号: H01L23/48 ; B32B3/24 ; B05D5/12 ; H01L21/44 ; G03F7/20
摘要:
A device including an imide layer with non-contact openings and the method for producing the device. One embodiment provides a substrate on a main surface of the substrate, an imide layer on the metallization layer, at least one contact opening through the imide layer and a plurality of non-contact openings in the imide layer. The non-contact openings are dimensioned to provide for an increased surface area of the imide layer or a surface area of the imide layer which is not reduced by more than 10 percent.
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