Invention Application
- Patent Title: METHOD OF ELECTROLESS PLATING
- Patent Title (中): 电镀镀层的方法
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Application No.: US12505560Application Date: 2009-07-20
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Publication No.: US20100015362A1Publication Date: 2010-01-21
- Inventor: Joo-Han LEE , Dong-Chun LEE , Yong-Hyun KIM , Seong-Chan Han
- Applicant: Joo-Han LEE , Dong-Chun LEE , Yong-Hyun KIM , Seong-Chan Han
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Priority: KR10-2008-0070525 20080721
- Main IPC: B05D1/18
- IPC: B05D1/18

Abstract:
An apparatus for electroless plating includes a plating bath containing an aqueous metal salt solution, and a magnetic field generator for generating a magnetic field. An object to be plated is immersed in the solution. The magnetic field generated by the magnetic field generator increases the level at which the metal ions are attracted to a surface of the object. Therefore, a layer of plating of good quality may be formed at a rapid rate.
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