发明申请
- 专利标题: METHOD OF MANUFACTURING MAGNETIC RECORDING MEDIUM
- 专利标题(中): 制造磁记录介质的方法
-
申请号: US12508269申请日: 2009-07-23
-
公开(公告)号: US20100018946A1公开(公告)日: 2010-01-28
- 发明人: Yousuke Isowaki , Kaori Kimura , Yoshiyuki Kamata , Masatoshi Sakurai
- 申请人: Yousuke Isowaki , Kaori Kimura , Yoshiyuki Kamata , Masatoshi Sakurai
- 申请人地址: JP Tokyo
- 专利权人: KABUSHIKI KAISHA TOSHIBA
- 当前专利权人: KABUSHIKI KAISHA TOSHIBA
- 当前专利权人地址: JP Tokyo
- 优先权: JP2008-192537 20080725
- 主分类号: G11B3/70
- IPC分类号: G11B3/70
摘要:
According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a hard mask and a resist on a magnetic recording layer, imprinting a stamper on the resist to transfer patterns of protrusions and recesses, removing resist residues left in the recesses of the patterned resist, etching the hard mask using the patterned resist as a mask to transfer the patterns of protrusions and recesses, stripping the resist, and performing ion beam etching to remove the remaining hard mask and to modify a surface of the magnetic recording layer uncovered with the remaining hard mask.
公开/授权文献
- US07967993B2 Method of manufacturing magnetic recording medium 公开/授权日:2011-06-28
信息查询
IPC分类: