发明申请
- 专利标题: METHOD FOR DETECTING PARTICLES AND DEFECTS AND INSPECTION EQUIPMENT THEREOF
- 专利标题(中): 检测颗粒和缺陷的方法及其检测设备
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申请号: US12574185申请日: 2009-10-06
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公开(公告)号: US20100020315A1公开(公告)日: 2010-01-28
- 发明人: Takahiro Togashi , Shigeru Matsui
- 申请人: Takahiro Togashi , Shigeru Matsui
- 申请人地址: JP Tokyo
- 专利权人: Hitachi High-Technologies Corp
- 当前专利权人: Hitachi High-Technologies Corp
- 当前专利权人地址: JP Tokyo
- 优先权: JP2006-187351 20060707
- 主分类号: G01N21/00
- IPC分类号: G01N21/00
摘要:
A method and equipment which includes an illustrated-spot illumination-distribution data table for storing an illumination distribution within an illustrated spot and which calculates a coordinate position for a particle or a defect and the diameter of the particle on the basis of detection light intensity data about the particle or defect and the illustrated-spot illumination-distribution data table. Thus, even when the illumination distribution within the illustrated spot based on an actual illumination optical system is not a Gaussian distribution, the calculation of the particle diameter of the detected particle or defect and the calculation of a coordinate position on the surface of an object to be inspected can be attained with an increased accuracy.