发明申请
- 专利标题： HIGH THROUGHPUT PROCESSING SYSTEM FOR CHEMICAL TREATMENT AND THERMAL TREATMENT AND METHOD OF OPERATING
- 专利标题（中）： 用于化学处理和热处理的高通量加工系统和操作方法
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申请号： US12183828申请日： 2008-07-31
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公开(公告)号： US20100024982A1公开(公告)日： 2010-02-04
- 发明人: Jay R. Wallace , Thomas Hamelin
- 申请人： Jay R. Wallace , Thomas Hamelin
- 申请人地址： JP Tokyo
- 专利权人： TOKYO ELECTRON LIMITED
- 当前专利权人： TOKYO ELECTRON LIMITED
- 当前专利权人地址： JP Tokyo
- 主分类号： C23F1/08
- IPC分类号： C23F1/08 ; B08B7/00
摘要：
A high throughput processing system having a chemical treatment system and a thermal treatment system for processing a plurality of substrates is described. The chemical treatment system is configured to chemically treat a plurality of substrates in a dry, non-plasma environment. The thermal treatment system is configured to thermally treat a plurality of substrates chemically treated in the chemical treatment system.