发明申请
US20100028562A1 PLASMA GENERATING APPARATUS, DEPOSITION APPARATUS, DEPOSITION METHOD, AND METHOD OF MANUFACTURING DISPLAY DEVICE
审中-公开
等离子体生成装置,沉积装置,沉积方法和制造显示装置的方法
- 专利标题: PLASMA GENERATING APPARATUS, DEPOSITION APPARATUS, DEPOSITION METHOD, AND METHOD OF MANUFACTURING DISPLAY DEVICE
- 专利标题(中): 等离子体生成装置,沉积装置,沉积方法和制造显示装置的方法
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申请号: US12533642申请日: 2009-07-31
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公开(公告)号: US20100028562A1公开(公告)日: 2010-02-04
- 发明人: Hitoshi NAKAGAWARA , Takayuki Moriwaki , Reiji Sakamoto , Atsushi Ueno
- 申请人: Hitoshi NAKAGAWARA , Takayuki Moriwaki , Reiji Sakamoto , Atsushi Ueno
- 申请人地址: JP Kanagawa-ken
- 专利权人: CANON ANELVA CORPORATION
- 当前专利权人: CANON ANELVA CORPORATION
- 当前专利权人地址: JP Kanagawa-ken
- 优先权: JP2008-197879 20080731; JP2009-151519 20090625
- 主分类号: C23C14/28
- IPC分类号: C23C14/28 ; B01J19/12
摘要:
A deposition apparatus includes a plasma gun including a hollow cathode which generates a plasma beam into a vacuum chamber including an exhaust system and one or more intermediate electrodes to provide a potential gradient for the plasma beam, a focusing coil which is provided to surround the outer surface of a tube portion of the vacuum chamber located coaxially with the exit portion for outputting a plasma beam from the plasma gun and draws the plasma beam into the vacuum chamber through the tube portion, and a reflected electron feedback electrode which is placed inside the tube portion coaxially with the exit portion of the plasma gun and has a positive polarity.
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