公开(公告)号：US20100028562A1

公开(公告)日：2010-02-04

申请号：US12533642

申请日：2009-07-31

申请人： Hitoshi NAKAGAWARA ,  Takayuki Moriwaki ,  Reiji Sakamoto ,  Atsushi Ueno

发明人： Hitoshi NAKAGAWARA ,  Takayuki Moriwaki ,  Reiji Sakamoto ,  Atsushi Ueno

IPC分类号： C23C14/28 ,  B01J19/12

CPC分类号： C23C14/32 ,  C23C14/081 ,  C23C14/28 ,  H01J37/32357

摘要： A deposition apparatus includes a plasma gun including a hollow cathode which generates a plasma beam into a vacuum chamber including an exhaust system and one or more intermediate electrodes to provide a potential gradient for the plasma beam, a focusing coil which is provided to surround the outer surface of a tube portion of the vacuum chamber located coaxially with the exit portion for outputting a plasma beam from the plasma gun and draws the plasma beam into the vacuum chamber through the tube portion, and a reflected electron feedback electrode which is placed inside the tube portion coaxially with the exit portion of the plasma gun and has a positive polarity.

摘要翻译： 沉积装置包括等离子体枪，其包括中空阴极，其产生等离子体束进入包括排气系统的真空室和一个或多个中间电极以提供等离子体束的电位梯度;聚焦线圈，被设置成围绕外部 真空室的管部分的表面与出口部分同轴地设置，用于输出来自等离子体枪的等离子体束，并且通过管部分将等离子体束吸入真空室中，并将反射电子反馈电极放置在管内 部分与等离子体枪的出口部分同轴并且具有正极性。