发明申请
- 专利标题： MICROELECTRONIC SUBSTRATE CLEANING SYSTEMS WITH POLYELECTROLYTE AND ASSOCIATED METHODS
- 专利标题（中）： 具有聚电解质和相关方法的微电子基板清洗系统
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申请号： US12195003申请日： 2008-08-20
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公开(公告)号： US20100043824A1公开(公告)日： 2010-02-25
- 发明人: Joseph N. Greeley , Nishant Sinha , Lukasz Hupka , Timothy A. Quick , Prashant Raghu
- 申请人： Joseph N. Greeley , Nishant Sinha , Lukasz Hupka , Timothy A. Quick , Prashant Raghu
- 申请人地址： US ID Boise
- 专利权人： Micron Technology, Inc.
- 当前专利权人： Micron Technology, Inc.
- 当前专利权人地址： US ID Boise
- 主分类号： B08B3/00
- IPC分类号： B08B3/00
摘要：
Several embodiments of cleaning systems using polyelectrolyte and various associated methods for cleaning microelectronic substrates are disclosed herein. One embodiment is directed to a system that has a substrate support for holding the microelectronic substrate, a dispenser positioned above the substrate support and facing a surface of the microelectronic substrate, a reservoir in fluid communication with the dispenser via a conduit, and a washing solution contained in the reservoir. The washing solution includes a polyelectrolyte.
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