发明申请
- 专利标题： THIN FILM LAMINATION, THIN FILM MAGNETIC SENSOR USING THE THIN FILM LAMINATION AND METHOD FOR MANUFACTURING THE THIN FILM LAMINATION
- 专利标题（中）： 薄膜层压，薄膜磁性传感器使用薄膜层压和制造薄膜层压的方法
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申请号： US12516538申请日： 2007-11-29
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公开(公告)号： US20100045282A1公开(公告)日： 2010-02-25
- 发明人: Ichiro Shibasaki , Hirotaka Geka , Atsushi Okamoto
- 申请人： Ichiro Shibasaki , Hirotaka Geka , Atsushi Okamoto
- 优先权： JP2006-324573 20061130
- 国际申请： PCT/JP2007/073058 WO 20071129
- 主分类号： G01R33/02
- IPC分类号： G01R33/02 ; B32B15/01 ; H01L21/20 ; H01L21/30
摘要：
Relating to a thin film lamination and a thin film magnetic sensor using the thin film lamination and a method for manufacturing the thin film lamination that realizes a thin film conducting layer having high electron mobility and sheet resistance as an InAsSb operating layer. A thin film lamination is provided which is characterized by having an AlxIn1-xSb mixed crystal layer formed on a substrate, and an InAsxSb1-x (0
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