Invention Application
- Patent Title: LITHOGRAPHIC APPARATUS, DRYING DEVICE, METROLOGY APPARATUS AND DEVICE MANUFACTURING METHOD
- Patent Title (中): 光刻装置，干燥装置，计量装置和装置制造方法
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Application No.: US12543011Application Date: 2009-08-18
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Publication No.: US20100045950A1Publication Date: 2010-02-25
- Inventor: Nicolaas Rudolf Kemper , Nicolaas Ten Kate , Joost Jeroen Ottens , Marcel Beckers , Marco Polizzi , Michel Riepen , Anthonie Kuijper , Koen Steffens , Adrianes Johannes Baeten , Anca Mihaela Antonevici
- Applicant: Nicolaas Rudolf Kemper , Nicolaas Ten Kate , Joost Jeroen Ottens , Marcel Beckers , Marco Polizzi , Michel Riepen , Anthonie Kuijper , Koen Steffens , Adrianes Johannes Baeten , Anca Mihaela Antonevici
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Main IPC: G03B27/52
- IPC: G03B27/52
Abstract:
An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.
Public/Granted literature
- US08953142B2 Lithographic apparatus, drying device, metrology apparatus and device manufacturing method Public/Granted day:2015-02-10
Information query
