发明申请
- 专利标题： Methods and Apparatus Configurations for Affecting Movement of Fluids Within a Microelectronic Topography Processing Chamber and a Method for Passivating Hardware Within a Microelectronic Topography Processing Chamber
- 专利标题（中）： 影响微电子地形处理室内流体运动的方法和装置结构及微电子地形处理室内钝化硬件的方法
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申请号： US12616367申请日： 2009-11-11
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公开(公告)号： US20100055300A1公开(公告)日： 2010-03-04
- 发明人: Igor C. Ivanov
- 申请人： Igor C. Ivanov
- 申请人地址： US CA Fremont
- 专利权人： LAM RESEARCH CORPORATION
- 当前专利权人： LAM RESEARCH CORPORATION
- 当前专利权人地址： US CA Fremont
- 主分类号： B05D5/12
- IPC分类号： B05D5/12
摘要：
An apparatus for processing microelectronic topographies, a method of use of such an apparatus, and a method for passivating hardware of microelectronic processing chambers are provided. The apparatus includes a substrate holder configured to support a microelectronic topography and a rotatable case with sidewalls arranged on opposing sides of the substrate holder. The method of using such an apparatus includes positioning a microelectronic topography upon a substrate holder of a processing chamber, exposing the microelectronic topography to a fluid within the processing chamber, and rotating a case of the processing chamber. The rotation is sufficient to affect movement of the fluid relative to the surface of the microelectronic topography. A method for passivating hardware of a microelectronic processing chamber includes exposing the hardware to an organic compound and subsequently exposing the hardware to an agent configured to form polar bonds with the organic compound.