发明申请
- 专利标题： LITHOGRAPHIC APPARATUS, METHOD OF MANUFACTURING AN ARTICLE FOR A LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- 专利标题（中）： 光刻设备，制造用于光刻设备的设备的方法和设备制造方法
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申请号： US12555301申请日： 2009-09-08
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公开(公告)号： US20100060870A1公开(公告)日： 2010-03-11
- 发明人: Nina Vladimirovna DZIOMKINA , Nicolaas TEN KATE , Sandra VAN DER GRAAF , Henricus Jozef CASTELIJNS
- 申请人： Nina Vladimirovna DZIOMKINA , Nicolaas TEN KATE , Sandra VAN DER GRAAF , Henricus Jozef CASTELIJNS
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： G03B27/52
- IPC分类号： G03B27/52 ; C23C16/00
摘要：
A lithographic apparatus is disclosed in which a specific coating is applied to a specific surface. The coating is made from at least 99 wt % of at least one of the following: a transition metal oxide; a poor metal oxide, sulfide or selenide; a compound with the formula ATiOn where A is an element from Group 2 of the Periodic Table; or TiO2 doped with a metal from Group 3, 5 or 7 of the Periodic Table, wherein the coating is less than or equal to 49 nm thick.
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