发明申请
US20100060878A1 EXPOSURE APPARTUS, EXPOSURE METHOD AND METHOD OF MANUFACTURING DISPLAY PANEL SUBSTRATE
审中-公开
曝光装置，曝光方法和制造显示板基板的方法
- 专利标题： EXPOSURE APPARTUS, EXPOSURE METHOD AND METHOD OF MANUFACTURING DISPLAY PANEL SUBSTRATE
- 专利标题（中）： 曝光装置，曝光方法和制造显示板基板的方法
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申请号： US12539281申请日： 2009-08-11
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公开(公告)号： US20100060878A1公开(公告)日： 2010-03-11
- 发明人: RYOUJI NEMOTO , TOMOAKI HAYASHI , SATOSHI UEHARA , MITSUYOSHI KOIZUMI , HIDETSUGU YUKI
- 申请人： RYOUJI NEMOTO , TOMOAKI HAYASHI , SATOSHI UEHARA , MITSUYOSHI KOIZUMI , HIDETSUGU YUKI
- 申请人地址： JP Tokyo
- 专利权人： HITACHI HIGH-TECHNOLOGIES CORPORATION
- 当前专利权人： HITACHI HIGH-TECHNOLOGIES CORPORATION
- 当前专利权人地址： JP Tokyo
- 优先权： JP2008-228176 20080905
- 主分类号： G03B27/58
- IPC分类号： G03B27/58 ; G01B11/14 ; G03B27/32
摘要：
A chuck 10 which supports a substrate 1 is moved by using an X-direction stage 5, and a position of the chuck 10 is detected at the same time. A traveling error of the X-direction stage 5 is detected according to a detecting result of position of the chuck 10. Then, a coordinate of drawing data supplied to a driving circuit 27 of a light beam irradiation device 20 is modified according to a detecting result of the traveling error of the X-direction stage 5, and the patterned data having the modified coordinate is supplied to the driving circuit 27 of the light beam irradiation device 20. Even if the traveling error such as shifting or yawing occurs in the X-direction stage 5, patterns can still be precisely drawn.
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