EXPOSURE APPARTUS, EXPOSURE METHOD AND METHOD OF MANUFACTURING DISPLAY PANEL SUBSTRATE
    1.
    发明申请
    EXPOSURE APPARTUS, EXPOSURE METHOD AND METHOD OF MANUFACTURING DISPLAY PANEL SUBSTRATE 审中-公开
    曝光装置,曝光方法和制造显示板基板的方法

    公开(公告)号:US20100060878A1

    公开(公告)日:2010-03-11

    申请号:US12539281

    申请日:2009-08-11

    IPC分类号: G03B27/58 G01B11/14 G03B27/32

    摘要: A chuck 10 which supports a substrate 1 is moved by using an X-direction stage 5, and a position of the chuck 10 is detected at the same time. A traveling error of the X-direction stage 5 is detected according to a detecting result of position of the chuck 10. Then, a coordinate of drawing data supplied to a driving circuit 27 of a light beam irradiation device 20 is modified according to a detecting result of the traveling error of the X-direction stage 5, and the patterned data having the modified coordinate is supplied to the driving circuit 27 of the light beam irradiation device 20. Even if the traveling error such as shifting or yawing occurs in the X-direction stage 5, patterns can still be precisely drawn.

    摘要翻译: 通过使用X方向台5移动支撑基板1的卡盘10,同时检测卡盘10的位置。 根据卡盘10的位置的检测结果来检测X方向台5的移动误差。然后,根据检测到的光束照射装置20的提供给驱动电路27的绘图数据的坐标被修改 X方向平台5的行进误差的结果,具有改变的坐标的图案化数据被提供给光束照射装置20的驱动电路27.即使在X方向上发生诸如偏移的行驶错误 方向阶段5,仍然可以精确绘制图案。

    EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD OF MANUFACTURING DISPLAY PANEL SUBSTRATE
    2.
    发明申请
    EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD OF MANUFACTURING DISPLAY PANEL SUBSTRATE 审中-公开
    曝光装置,曝光方法和制造显示面板基板的方法

    公开(公告)号:US20100103397A1

    公开(公告)日:2010-04-29

    申请号:US12540879

    申请日:2009-08-13

    IPC分类号: G03B27/54 G03B27/32

    CPC分类号: G03B27/32 G03F7/70275

    摘要: A position of a chuck 10 is detected. The movements of the stages 5 and 7 are controlled according to a result of detecting the position of the chuck 10, so as to position the chuck 10. Further, a light receiving means 51 is disposed on the chuck 10 for receiving a light beam irradiated from a head 20a of a light beam irradiation device 20. The misalignment of the head 20a of the light beam irradiation device 20 is detected based on the received light beam. According to a result of detecting the misalignment, a coordinate of drawing data supplied to a DMD driving circuit 27 of each light beam irradiation device 20 is modified. Moreover, the drawing data with the modified coordinate is supplied to the DMD driving circuit 27 of each light beam irradiation device 20.

    摘要翻译: 检测卡盘10的位置。 根据检测卡盘10的位置的结果来控制级5和7的运动,以便定位卡盘10.此外,光盘接收装置51设置在卡盘10上以接收照射的光束 来自光束照射装置20的头部20a。基于所接收的光束来检测光束照射装置20的头部20a的未对准。 根据检测到未对准的结果,修改提供给每个光束照射装置20的DMD驱动电路27的绘图数据的坐标。 此外,具有改变的坐标的绘制数据被提供给每个光束照射装置20的DMD驱动电路27。

    EXPOSURE APPARATUS, EXPOSURE METHOD AND METHOD OF MANUFACTURING DISPLAY PANEL SUBSTRATE
    3.
    发明申请
    EXPOSURE APPARATUS, EXPOSURE METHOD AND METHOD OF MANUFACTURING DISPLAY PANEL SUBSTRATE 审中-公开
    曝光装置,曝光方法和制造显示板基板的方法

    公开(公告)号:US20100040964A1

    公开(公告)日:2010-02-18

    申请号:US12540858

    申请日:2009-08-13

    IPC分类号: G03F7/20 G03B27/58

    摘要: A range of a coordinate of drawing data supplied to a digital micromirror device (DMD) driving circuit 27 of a light beam irradiation device 20 is determined to configure a bandwidth of a light beam irradiated from an irradiation optical system of the light beam irradiation device 20. The drawing data having the determined range of the coordinate is supplied to the DMD driving circuit 27 of the light beam irradiation device 20. Movement of a stage 7 is controlled to move a chuck 10 for only a distance less than the bandwidth of the light beam irradiated from the irradiation optical system of the light beam irradiation device 20 towards a direction perpendicular to a scanning direction of the substrate by the light beam of the light beam irradiation device 20, at each scanning, and a same region of the substrate is scanned multiple times.

    摘要翻译: 确定提供给光束照射装置20的数字微镜装置(DMD)驱动电路27的绘制数据的坐标范围,以构成从光束照射装置20的照射光学系统照射的光束的带宽 具有确定的坐标范围的绘图数据被提供给光束照射装置20的DMD驱动电路27.阶段7的移动被控制以将卡盘10移动到仅小于光的带宽的距离 通过光束照射装置20的光束,在每次扫描时,从基板的照射光学系统向与基板的扫描方向正交的方向照射的光束和基板的相同区域被扫描 多次。