摘要:
A chuck 10 which supports a substrate 1 is moved by using an X-direction stage 5, and a position of the chuck 10 is detected at the same time. A traveling error of the X-direction stage 5 is detected according to a detecting result of position of the chuck 10. Then, a coordinate of drawing data supplied to a driving circuit 27 of a light beam irradiation device 20 is modified according to a detecting result of the traveling error of the X-direction stage 5, and the patterned data having the modified coordinate is supplied to the driving circuit 27 of the light beam irradiation device 20. Even if the traveling error such as shifting or yawing occurs in the X-direction stage 5, patterns can still be precisely drawn.
摘要:
A position of a chuck 10 is detected. The movements of the stages 5 and 7 are controlled according to a result of detecting the position of the chuck 10, so as to position the chuck 10. Further, a light receiving means 51 is disposed on the chuck 10 for receiving a light beam irradiated from a head 20a of a light beam irradiation device 20. The misalignment of the head 20a of the light beam irradiation device 20 is detected based on the received light beam. According to a result of detecting the misalignment, a coordinate of drawing data supplied to a DMD driving circuit 27 of each light beam irradiation device 20 is modified. Moreover, the drawing data with the modified coordinate is supplied to the DMD driving circuit 27 of each light beam irradiation device 20.
摘要:
A range of a coordinate of drawing data supplied to a digital micromirror device (DMD) driving circuit 27 of a light beam irradiation device 20 is determined to configure a bandwidth of a light beam irradiated from an irradiation optical system of the light beam irradiation device 20. The drawing data having the determined range of the coordinate is supplied to the DMD driving circuit 27 of the light beam irradiation device 20. Movement of a stage 7 is controlled to move a chuck 10 for only a distance less than the bandwidth of the light beam irradiated from the irradiation optical system of the light beam irradiation device 20 towards a direction perpendicular to a scanning direction of the substrate by the light beam of the light beam irradiation device 20, at each scanning, and a same region of the substrate is scanned multiple times.