Invention Application
US20100068416A1 LITHOGRAPHIC APPARATUS AND METHOD 有权
LITHOGRAPHIC设备和方法

LITHOGRAPHIC APPARATUS AND METHOD
Abstract:
A lithographic method includes providing particles in dry form on a substrate, or on material provided on the substrate, irradiating one or more of the particles with a dose of radiation, the dose of radiation being sufficient to ensure that at least one particle of the one or more particles is bonded to the substrate, or to the material provided on the substrate, and removing particles from the substrate, or from material provided on the substrate, that have not been bonded to the substrate, or to the material provided on the substrate.
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