发明申请
- 专利标题: LASER SCATTERING DEFECT INSPECTION SYSTEM AND LASER SCATTERING DEFECT INSPECTION METHOD
- 专利标题(中): 激光散射缺陷检测系统和激光散射缺陷检测方法
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申请号: US12571791申请日: 2009-10-01
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公开(公告)号: US20100085561A1公开(公告)日: 2010-04-08
- 发明人: Eiji KAMIYAMA , Takehiro TSUNEMORI , Kazuhiro YAMAMOTO , Kenji AOKI
- 申请人: Eiji KAMIYAMA , Takehiro TSUNEMORI , Kazuhiro YAMAMOTO , Kenji AOKI
- 申请人地址: JP Tokyo
- 专利权人: SUMCO CORPORATION
- 当前专利权人: SUMCO CORPORATION
- 当前专利权人地址: JP Tokyo
- 优先权: JP2008-259804 20081006
- 主分类号: G01N21/00
- IPC分类号: G01N21/00
摘要:
A laser scattering defect inspection system includes: a stage unit that rotates a workpiece W and transports the workpiece W in one direction; a laser light source that emits a laser beam LB toward the workpiece W mounted on the stage unit; an optical deflector that scans the laser beam LB emitted from the laser light source on the workpiece W; an optical detector that detects the laser beam LB scattered from the surface of the workpiece W; a storage unit that stores defect inspection conditions for each inspection step of a manufacturing process of the workpiece W, where the conditions include the rotation speed and the moving speed of the workpiece W by the stage unit, the scan width on the workpiece W and the scan frequency by the optical deflector; and a control unit that reads the defect inspection conditions stored for each inspection step in the storage unit and controls the driving of the stage unit and the optical deflector under the conditions.
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