发明申请
- 专利标题: Optical semiconductor device and manufacturing method of the same
- 专利标题(中): 光半导体器件及其制造方法
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申请号: US12654016申请日: 2009-12-08
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公开(公告)号: US20100090196A1公开(公告)日: 2010-04-15
- 发明人: Nami Yasuoka , Kenichi Kawaguchi
- 申请人: Nami Yasuoka , Kenichi Kawaguchi
- 申请人地址: JP Kawasaki
- 专利权人: FUJITSU LIMITED
- 当前专利权人: FUJITSU LIMITED
- 当前专利权人地址: JP Kawasaki
- 优先权: JP2006-045856 20060222
- 主分类号: H01L29/66
- IPC分类号: H01L29/66
摘要:
A side barrier is provided between columnar dots each constituted by directly stacking respective quantum dots in seven or more layers. Out of respective side barrier layers composing the side barrier, each of the lower side barrier layers (four layers of the undermost layer to the fourth layer from the bottom) is formed as a first side barrier layer into which a tensile strain is introduced, and each of the upper side barrier layers (three layers of the fifth Layer to the uppermost layer from the bottom) is formed as a second side barrier layer which has no strain.
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