发明申请
- 专利标题： LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- 专利标题（中）： LITHOGRAPHIC装置和装置制造方法
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申请号： US12647876申请日： 2009-12-28
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公开(公告)号： US20100091255A1公开(公告)日： 2010-04-15
- 发明人: Bob STREEFKERK , Henrikus Herman Cox , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Koen Jacobus Johannes M. Zaal , Minne Cuperus
- 申请人： Bob STREEFKERK , Henrikus Herman Cox , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Koen Jacobus Johannes M. Zaal , Minne Cuperus
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： G03B27/52
- IPC分类号： G03B27/52 ; G03B27/32
摘要：
An immersion lithographic apparatus includes a liquid supply system member configured to contain a liquid in a space between a projection system of the lithographic apparatus and the substrate and a liquid supply system member compensator arranged to compensate an interaction between the liquid supply system member and substrate table.
公开/授权文献
- US08749754B2 Lithographic apparatus and device manufacturing method 公开/授权日：2014-06-10
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