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公开(公告)号：US07671963B2
公开(公告)日：2010-03-02
申请号：US11132415
申请日：2005-05-19
申请人： Bob Streefkerk , Henrikus Herman Cox , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Koen Jacobus Johannes M Zaal , Minne Cuperus
发明人： Bob Streefkerk , Henrikus Herman Cox , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Koen Jacobus Johannes M Zaal , Minne Cuperus
CPC分类号： G03F7/70341 , G03F7/70641 , G03F7/70783
摘要： An immersion lithographic apparatus includes a liquid supply system member configured to contain a liquid in a space between a projection system of the lithographic apparatus and the substrate and a liquid supply system member compensator arranged to compensate an interaction between the liquid supply system member and substrate table.
摘要翻译： 浸没式光刻设备包括液体供应系统构件，其构造成在光刻设备的投影系统和基板之间的空间中容纳液体，液体供应系统构件补偿器被布置成补偿液体供应系统构件和衬底台之间的相互作用 。
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公开(公告)号：US20100091255A1
公开(公告)日：2010-04-15
申请号：US12647876
申请日：2009-12-28
申请人： Bob STREEFKERK , Henrikus Herman Cox , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Koen Jacobus Johannes M. Zaal , Minne Cuperus
发明人： Bob STREEFKERK , Henrikus Herman Cox , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Koen Jacobus Johannes M. Zaal , Minne Cuperus
CPC分类号： G03F7/70341 , G03F7/70641 , G03F7/70783
摘要： An immersion lithographic apparatus includes a liquid supply system member configured to contain a liquid in a space between a projection system of the lithographic apparatus and the substrate and a liquid supply system member compensator arranged to compensate an interaction between the liquid supply system member and substrate table.
摘要翻译： 浸没式光刻设备包括液体供应系统构件，其构造成在光刻设备的投影系统和基板之间的空间中容纳液体，液体供应系统构件补偿器被布置成补偿液体供应系统构件和基板台之间的相互作用 。
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公开(公告)号：US08749754B2
公开(公告)日：2014-06-10
申请号：US12647876
申请日：2009-12-28
申请人： Bob Streefkerk , Henrikus Herman Marie Cox , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Koen Jacobus Johannes Maria Zaal , Minne Cuperus
发明人： Bob Streefkerk , Henrikus Herman Marie Cox , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Koen Jacobus Johannes Maria Zaal , Minne Cuperus
CPC分类号： G03F7/70341 , G03F7/70641 , G03F7/70783
摘要： An immersion lithographic apparatus includes a liquid supply system member configured to contain a liquid in a space between a projection system of the lithographic apparatus and the substrate and a liquid supply system member compensator arranged to compensate an interaction between the liquid supply system member and substrate table.
摘要翻译： 浸没式光刻设备包括液体供应系统构件，其构造成在光刻设备的投影系统和基板之间的空间中容纳液体，液体供应系统构件补偿器被布置成补偿液体供应系统构件和衬底台之间的相互作用 。
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公开(公告)号：US08553201B2
公开(公告)日：2013-10-08
申请号：US12243291
申请日：2008-10-01
申请人： Bob Streefkerk , Henrikus Herman Marie Cox , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Koen Jacobus Johannes Maria Zaal , Minne Cuperus
发明人： Bob Streefkerk , Henrikus Herman Marie Cox , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Koen Jacobus Johannes Maria Zaal , Minne Cuperus
CPC分类号： G03F7/70341 , G03F7/70641 , G03F7/70783
摘要： An immersion lithographic apparatus includes a liquid supply system member configured to contain a liquid in a space between a projection system of the lithographic apparatus and the substrate and a liquid supply system member compensator arranged to compensate an interaction between the liquid supply system member and substrate table.
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公开(公告)号：US07486381B2
公开(公告)日：2009-02-03
申请号：US10850451
申请日：2004-05-21
申请人： Bob Streefkerk , Henrikus Herman Marie Cox , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Koen Jacobus Johannes Maria Zaal , Minne Cuperus
发明人： Bob Streefkerk , Henrikus Herman Marie Cox , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Koen Jacobus Johannes Maria Zaal , Minne Cuperus
CPC分类号： G03F7/70341 , G03F7/70641 , G03F7/70783
摘要： An immersion lithographic apparatus includes a liquid supply system member configured to contain a liquid in a space between a projection system of the lithographic apparatus and the substrate and a liquid supply system member compensator arranged to compensate an interaction between the liquid supply system member and substrate table.
摘要翻译： 浸没式光刻设备包括液体供应系统构件，其构造成在光刻设备的投影系统和基板之间的空间中容纳液体，液体供应系统构件补偿器被布置成补偿液体供应系统构件和衬底台之间的相互作用 。
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公开(公告)号：US20120013873A1
公开(公告)日：2012-01-19
申请号：US13242004
申请日：2011-09-23
申请人： Bob Streefkerk , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Michel Riepen
发明人： Bob Streefkerk , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Michel Riepen
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.
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公开(公告)号：US20120013869A1
公开(公告)日：2012-01-19
申请号：US13240803
申请日：2011-09-22
申请人： Christiaan Alexander HOOGENDAM , Bob Streefkerk , Johannes Catharinus Hubertus Mulkens , Erik Theodorus Maria Bijlaart , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Bernardus Antonius Slaghekke , Patricius Aloysius Jacobus Tinnemans , Helmar Van Santen
发明人： Christiaan Alexander HOOGENDAM , Bob Streefkerk , Johannes Catharinus Hubertus Mulkens , Erik Theodorus Maria Bijlaart , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Bernardus Antonius Slaghekke , Patricius Aloysius Jacobus Tinnemans , Helmar Van Santen
IPC分类号： G03B27/52
CPC分类号： G03F7/70866 , G03F7/70341 , G03F7/70808
摘要： Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.
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公开(公告)号：US20110170077A1
公开(公告)日：2011-07-14
申请号：US12850472
申请日：2010-08-04
申请人： Joeri LOF , Erik Theodorus Maria Bijlaart , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
发明人： Joeri LOF , Erik Theodorus Maria Bijlaart , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/707 , G03F7/7085 , G03F7/70866
摘要： A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.
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公开(公告)号：US20110001942A1
公开(公告)日：2011-01-06
申请号：US12698938
申请日：2010-02-02
申请人： Joeri Lof , Erik Theodorus Maria Butler , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Staaijer , Bob Streefkerk , Helmar Van Santen
发明人： Joeri Lof , Erik Theodorus Maria Butler , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Staaijer , Bob Streefkerk , Helmar Van Santen
IPC分类号： G03B27/58
CPC分类号： G03F7/70341 , G03F7/707 , G03F7/7085 , G03F7/70866
摘要： A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.
摘要翻译： 公开了一种光刻投影装置，其中投影系统和基板之间的空间填充有液体。 边缘密封构件至少部分地围绕衬底台面上的衬底或其它物体，以防止衬底或其他物体的边缘部分例如成像或照亮时的液体损失。
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公开(公告)号：US20100141915A1
公开(公告)日：2010-06-10
申请号：US12694880
申请日：2010-01-27
申请人： Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Bob Streefkerk
发明人： Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Bob Streefkerk
IPC分类号： G03B27/42
CPC分类号： G03F9/7023 , G03F7/70341 , G03F7/70883
摘要： A lithographic apparatus, includes a support structure configured to hold a patterning device, the patterning device configured to impart a beam of radiation with a pattern in its cross-section; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate table; a sensor configured to measure an exposure parameter using a measuring beam projected through the liquid; and a correction system configured to determine an offset based on a change of a physical property impacting a measurement made using the measuring beam to at least partly correct the measured exposure parameter.
摘要翻译： 光刻设备包括被配置为保持图案形成装置的支撑结构，所述图案形成装置被配置成在其横截面中赋予图案的辐射束; 被配置为保持基板的基板台; 投影系统，被配置为将所述图案化的光束投影到所述基板的目标部分上; 液体供应系统，被配置为向所述投影系统和所述基板台之间的空间提供液体; 传感器，被配置为使用通过所述液体投影的测量光束来测量曝光参数; 以及校正系统，其被配置为基于影响使用所述测量光束进行的测量的物理属性的变化来确定偏移，以至少部分地校正所测量的曝光参数。
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