发明申请
- 专利标题： APPARATUS AND METHODS FOR CONDITIONING A POLISHING PAD
- 专利标题（中）： 用于调节抛光垫的装置和方法
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申请号： US12636326申请日： 2009-12-11
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公开(公告)号： US20100093263A1公开(公告)日： 2010-04-15
- 发明人: Roy C. Nangoy , Shou-Sung Chang , Donald J. K. Olgado , Hung Chih Chen , Gerald John Alonzo
- 申请人： Roy C. Nangoy , Shou-Sung Chang , Donald J. K. Olgado , Hung Chih Chen , Gerald John Alonzo
- 申请人地址： US CA Santa Clara
- 专利权人： APPLIED MATERIALS, INC.
- 当前专利权人： APPLIED MATERIALS, INC.
- 当前专利权人地址： US CA Santa Clara
- 主分类号： B24B53/02
- IPC分类号： B24B53/02
摘要：
Apparatus and methods for conditioning a polishing pad include an arm adapted to support a conditioning disk; a drive mechanism coupled to the arm; and a flexible coupling between the drive mechanism and the conditioning disk adapted to allow the conditioning disk to tilt while transmitting rotary motion from the drive mechanism to the conditioning disk. Numerous other aspects are disclosed.
公开/授权文献
- US07963826B2 Apparatus and methods for conditioning a polishing pad 公开/授权日：2011-06-21