公开(公告)号：US20160016281A1

公开(公告)日：2016-01-21

申请号：US14801630

申请日：2015-07-16

Applicant: Hung Chih Chen

Inventor： Hung Chih Chen

IPC: B24B37/10 ,  B24B37/26 ,  H01L21/67

CPC classification number: B24B37/10 ,  B24B37/11 ,  B24B37/26 ,  B24B37/30 ,  H01L21/30625 ,  H01L21/31051 ,  H01L21/32115 ,  H01L21/3212 ,  H01L21/7684

Abstract: Chemical mechanical polishing can be used for “touch-up polishing” in which polishing is performed on a limited area of the front surface of the substrate. The contact area between the polishing pad and the substrate can be substantially smaller than the radius surface of the substrate. During polishing, the polishing pad can undergo an orbital motion. The polishing pad can be maintained in a fixed angular orientation during the orbital motion. The contact area can be arc-shaped. The contact area can be provided by one or more lower portions projecting downward from an upper portion of the polishing pad. A perimeter portion of the polishing pad can be vertically fixed to an annular member and a remainder of the polishing pad within the perimeter portion can be vertically free.

Abstract translation: 化学机械抛光可用于在基板前表面的有限区域上进行抛光的“研磨抛光”。 抛光垫和基板之间的接触面积可以基本上小于基板的半径表面。 在抛光期间，抛光垫可以进行轨道运动。 在轨道运动期间，抛光垫可以保持在固定的角度定向。 接触区域可以是弧形的。 接触区域可以由从抛光垫的上部向下突出的一个或多个下部提供。 抛光垫的周边部分可以垂直地固定到环形构件，并且周边部分内的抛光垫的其余部分可以是垂直自由的。

公开(公告)号：US20150050105A1

公开(公告)日：2015-02-19

申请号：US13882135

申请日：2012-07-25

Applicant: Dan Zhang ,  Hui Chen ,  Jim K. Atkinson ,  Hung Chih Chen ,  Allen L. D'Ambra

Inventor： Dan Zhang ,  Hui Chen ,  Jim K. Atkinson ,  Hung Chih Chen ,  Allen L. D'Ambra

IPC: H01L21/67 ,  H01L21/677 ,  B25J11/00 ,  H01L21/673 ,  F26B25/00 ,  F26B25/14

CPC classification number: H01L21/67034 ,  B25J11/0095 ,  F26B25/001 ,  F26B25/14 ,  H01L21/67057 ,  H01L21/67326 ,  H01L21/67748 ,  H01L21/67751

Abstract: Embodiments described herein generally relate to a vapor dryer module for cleaning substrates during a chemical mechanical polishing (CMP) process. In one embodiment, a module for processing a substrate is provided. The module includes a tank having sidewalls with an outer surface and an inner surface defining a processing volume, a substrate support structure for transferring a substrate within the processing volume, the substrate support structure having a first portion that is at least partially disposed in the processing volume and a second portion that is outside of the processing volume, and one or more actuators disposed on an outer surface of one of the sidewalls of the tank and coupled between the outer surface and the second portion of the support structure, the one or more actuators operable to move the support structure relative to the tank.

Abstract translation: 本文描述的实施例通常涉及用于在化学机械抛光（CMP）工艺期间清洁衬底的蒸汽干燥器模块。 在一个实施例中，提供了一种用于处理衬底的模块。 模块包括具有外表面和限定处理体积的内表面的侧壁的槽，用于在处理体积内转移衬底的衬底支撑结构，衬底支撑结构具有至少部分地设置在处理中的第一部分 体积和在处理体积外的第二部分，以及一个或多个致动器，其设置在罐的侧壁中的一个的外表面上并且联接在支撑结构的外表面和第二部分之间，一个或多个 致动器可操作以相对于罐移动支撑结构。

公开(公告)号：US08922984B2

公开(公告)日：2014-12-30

申请号：US13542769

申请日：2012-07-06

Applicant: Chun-Chien Chen ,  Chu-Chia Tsai ,  Cheng-Shing Liu ,  Tai-Chuan Chen ,  Ming-Ju Hsieh ,  Tien-Chung Tseng ,  Chien-Yuan Lai ,  Hung-Chih Chen ,  Shang-Mao Lee ,  Cheng-Hsiang Chuang

Inventor： Chun-Chien Chen ,  Chu-Chia Tsai ,  Cheng-Shing Liu ,  Tai-Chuan Chen ,  Ming-Ju Hsieh ,  Tien-Chung Tseng ,  Chien-Yuan Lai ,  Hung-Chih Chen ,  Shang-Mao Lee ,  Cheng-Hsiang Chuang

IPC: G06F1/16

CPC classification number: G06F1/1679 ,  G06F1/1616 ,  G06F1/1624

Abstract: A portable computer includes a base, a display module, and a support element. The base includes a first area, a second area, and a sliding assembly disposed at a substantially central position of the second area. The sliding assembly includes a sliding element and a guiding structure, and the sliding element can move along the guiding structure to slide at least in the second area. The display module includes a connecting end combined with the sliding element and a support plane. The support element includes a first area pivotally connected to the support plane and a second end pivotally connected to a rear end of the base. When the display module is opened, the display module further rotates around the first fixed end and moves the connecting end simultaneously. Then, the display module is supported by the support element to keep a suitable tilted angle.

Abstract translation: 便携式计算机包括基座，显示模块和支撑元件。 基座包括第一区域，第二区域和设置在第二区域的大致中心位置处的滑动组件。 滑动组件包括滑动元件和引导结构，并且滑动元件可以沿着引导结构移动至少在第二区域中滑动。 显示模块包括与滑动元件和支撑平面组合的连接端。 支撑元件包括枢转地连接到支撑平面的第一区域和可枢转地连接到基座的后端的第二端。 当显示模块打开时，显示模块进一步围绕第一固定端旋转并同时移动连接端。 然后，显示模块由支撑元件支撑以保持合适的倾斜角度。

公开(公告)号：US20140120803A1

公开(公告)日：2014-05-01

申请号：US13661603

申请日：2012-10-26

Applicant: Hung Chih Chen ,  Samuel Chu-Chiang Hsu ,  Gautam Shashank Dandavate

Inventor： Hung Chih Chen ,  Samuel Chu-Chiang Hsu ,  Gautam Shashank Dandavate

IPC: B24B37/32 ,  B24B7/00

CPC classification number: B24B37/32 ,  B24B7/00 ,  B24B7/228

Abstract: A retaining ring for holding a substrate below a carrier head during chemical mechanical polishing includes an annular lower portion and an annular upper portion secured to the lower portion. The annular lower portion has a main body with a bottom surface for contacting a polishing pad during polishing, and is a first material. A top surface of the upper portion is configured to be secured to the carrier head. The upper portion is a second material that is more rigid than the first material. A thickness and stiffness of the lower portion is selected for a particular polishing environment to improve polishing uniformity near an edge of the substrate.

Abstract translation: 在化学机械抛光期间用于将基板保持在载体头下方的保持环包括环形下部和固定到下部的环形上部。 环形下部具有主体，其具有用于在抛光期间接触抛光垫的底表面，并且是第一材料。 上部的上表面构造成固定到承载头。 上部是比第一材料更刚性的第二材料。 选择下部的厚度和刚度用于特定的抛光环境以改善靠近基底边缘的抛光均匀性。

公开(公告)号：US20140020829A1

公开(公告)日：2014-01-23

申请号：US13552377

申请日：2012-07-18

Applicant: Hung Chih Chen ,  Gautam Shashank Dandavate ,  Samuel Chu-Chiang Hsu ,  Denis M. Koosau

Inventor： Hung Chih Chen ,  Gautam Shashank Dandavate ,  Samuel Chu-Chiang Hsu ,  Denis M. Koosau

IPC: B05C9/08

CPC classification number: B24B37/30 ,  B24B37/015

Abstract: Sensors can be located in a carrier head for a chemical mechanical polishing system. In some implementations the carrier head includes a flexible membrane, and a thermocouple is positioned on the lower surface of the flexible membrane or embedded in the flexible membrane adjacent the lower surface. In some implementations, the carrier head optical sensor is secured to the head and positioned to sense a reflectivity of a spot on a back surface of a substrate held in the carrier head, and a controller is configured to receive a signal from the optical sensor and determine precession of the substrate based on the signal.

Abstract translation: 传感器可以位于用于化学机械抛光系统的载体头中。 在一些实施方案中，载体头包括柔性膜，并且热电偶位于柔性膜的下表面上或嵌入在柔性膜中，邻近下表面。 在一些实施方案中，载体头部光学传感器被固定到头部并被定位成感测保持在载体头部中的基底的背面上的斑点的反射率，并且控制器被配置为从光学传感器接收信号， 基于信号确定基板的进动。

公开(公告)号：US08550879B2

公开(公告)日：2013-10-08

申请号：US12256845

申请日：2008-10-23

Applicant: Hung Chih Chen ,  Sen-Hou Ko ,  Shou-Sung Chang

Inventor： Hung Chih Chen ,  Sen-Hou Ko ,  Shou-Sung Chang

IPC: B24B1/00 ,  B24B21/18

CPC classification number: B24B53/017

Abstract: Embodiments of the present invention generally provide an improved conditioning module and conditioning disks for improved pressure distribution during the process of conditioning a polishing pad of a chemical mechanical polishing (CMP) system. In one embodiment, a conditioning module comprising multiple, small conditioning disks is provided. In one embodiment, a conditioning disk having a compliant backing member is provided. In one embodiment, the compliant backing member comprises a semi-rigid backing member cut into a spiral shape to provide compliancy. In another embodiment, the compliant backing member comprises a fluid-pressurized, flexible membrane. Each embodiment of the present invention provides an improved pressure distribution across the face of each conditioning disk, resulting in increased disk life as well as increased conditioning rate and uniformity.

Abstract translation: 本发明的实施例通常提供改进的调节模块和调节盘，用于在调节化学机械抛光（CMP）系统的抛光垫的过程中改善压力分布。 在一个实施例中，提供了包括多个小调节盘的调节模块。 在一个实施例中，提供了具有柔顺背衬构件的调节盘。 在一个实施例中，柔顺背衬构件包括切割成螺旋形状以提供符合性的半刚性背衬构件。 在另一个实施例中，顺从背衬构件包括流体加压的柔性膜。 本发明的每个实施例提供了在每个调节盘的表面上的改进的压力分布，导致增加的盘寿命以及增加的调节速率和均匀性。

公开(公告)号：US08454413B2

公开(公告)日：2013-06-04

申请号：US11614940

申请日：2006-12-21

Applicant: Jeonghoon Oh ,  Tsz-Sin Siu ,  Hung Chih Chen ,  Andrew J. Nagengast ,  Steven M. Zuniga ,  Thomas B. Brezoczky

Inventor： Jeonghoon Oh ,  Tsz-Sin Siu ,  Hung Chih Chen ,  Andrew J. Nagengast ,  Steven M. Zuniga ,  Thomas B. Brezoczky

IPC: B24B41/06

CPC classification number: B24B37/30 ,  B24B41/06 ,  B29C33/424 ,  B29C35/02 ,  B29K2023/00 ,  B29K2083/00 ,  B29K2995/0074 ,  B29L2031/755

Abstract: A flexible membrane for use in a carrier head has a generally circular main portion with a lower surface, an annular outer portion for connection to a base assembly, and an annular flap extending from the main portion on a side opposite the lower surface for connection to the base assembly. At least one surface of the flap has a surface texture to prevent adhesion.

Abstract translation: 用于载体头部的柔性膜具有大致圆形的主要部分，具有下表面，用于连接到基座组件的环形外部部分和从主体部分在与下表面相对的一侧延伸的环形挡片，用于连接到 基座组件。 翼片的至少一个表面具有表面纹理以防止粘附。

公开(公告)号：US20130127730A1

公开(公告)日：2013-05-23

申请号：US13616071

申请日：2012-09-14

Applicant: Shang-Mao Lee ,  Chun-Chien Chen ,  Hung-Chih Chen ,  Cheng-Hsiang Chuang ,  Chia-Lian Yen

Inventor： Shang-Mao Lee ,  Chun-Chien Chen ,  Hung-Chih Chen ,  Cheng-Hsiang Chuang ,  Chia-Lian Yen

IPC: G06F3/02 ,  H05K5/02

CPC classification number: G06F1/1637 ,  G06F1/1616 ,  G06F1/1624 ,  G06F1/1679 ,  G06F1/1681

Abstract: A portable computer comprises a base, a display module, at least one support element and at least one sliding assembly. The base comprises a first area and a second area. The display module comprises a connect end and a display face. Each support element comprises a first end pivoted on a portion of the display module other than the display face and a second end pivoted on the rear end of the base. Each sliding assembly comprises a rod element disposed at least in the second area and a sleeve sliding element connected with the connect end and moved along the rod element.

Abstract translation: 便携式计算机包括基座，显示模块，至少一个支撑元件和至少一个滑动组件。 基座包括第一区域和第二区域。 显示模块包括连接端和显示面。 每个支撑元件包括枢转在除了显示面之外的显示模块的一部分上的第一端和枢转在基座后端的第二端。 每个滑动组件包括至少设置在第二区域中的杆元件和与连接端连接并沿着杆元件移动的套筒滑动元件。

公开(公告)号：US08337279B2

公开(公告)日：2012-12-25

申请号：US12489132

申请日：2009-06-22

Applicant: Sivakumar Dhandapani ,  Stan D. Tsai ,  Daxin Mao ,  Sameer Deshpande ,  Shou-Sung Chang ,  Gregory E. Menk ,  Charles C. Garretson ,  Jason Garcheung Fung ,  Christopher D. Cocca ,  Hung Chih Chen

Inventor： Sivakumar Dhandapani ,  Stan D. Tsai ,  Daxin Mao ,  Sameer Deshpande ,  Shou-Sung Chang ,  Gregory E. Menk ,  Charles C. Garretson ,  Jason Garcheung Fung ,  Christopher D. Cocca ,  Hung Chih Chen

IPC: B24B1/00 ,  B24B49/00 ,  B24B51/00

CPC classification number: B24B49/18 ,  B24B37/005 ,  B24B37/042

Abstract: A method and apparatus for conditioning a polishing pad is provided. The conditioning element is held by a conditioning arm rotatably mounted to a base at a pivot point. An actuator pivots the arm about the pivot point. The conditioning element is urged against the surface of the polishing pad, and translated with respect to the polishing pad to remove material from the polishing pad and roughen its surface. The interaction of the abrasive conditioning surface with the polishing pad surface generates a frictional force. The frictional force may be monitored by monitoring the torque applied to the pivot point, and material removal controlled thereby. The conditioning time, down force, translation rate, or rotation of the conditioning pad may be adjusted based on the measured torque.

Abstract translation: 提供了一种用于调理抛光垫的方法和装置。 调节元件由可旋转地安装到枢轴点处的基座的调节臂保持。 执行器绕枢轴点枢转臂。 调理元件被推靠在抛光垫的表面上，并相对于抛光垫平移以从抛光垫移除材料并使其表面变粗糙。 研磨调理表面与抛光垫表面的相互作用产生摩擦力。 可以通过监视施加到枢转点的扭矩来监测摩擦力，并且由此控制材料移除。 调节垫的调节时间，下压力，平移速率或旋转可以基于测量的扭矩来调节。

公开(公告)号：US08298047B2

公开(公告)日：2012-10-30

申请号：US12987709

申请日：2011-01-10

Applicant: Steven M. Zuniga ,  Hung Chih Chen

Inventor： Steven M. Zuniga ,  Hung Chih Chen

IPC: B24B5/35

CPC classification number: B24B37/32 ,  B24B37/28

Abstract: A retainer is used with an apparatus for polishing a substrate. The substrate has upper and lower surfaces and a lateral, substantially circular, perimeter. The apparatus has a polishing pad with an upper polishing surface for contacting and polishing the lower face of the substrate. The retainer has an inward facing retaining face for engaging and retaining the substrate against lateral movement during polishing of the substrate. The retaining face engages a substrate perimeter at more than substantially a single discrete circumferential location along the perimeter.

Abstract translation: 保持器用于抛光衬底的装置。 衬底具有上表面和下表面以及侧面，基本上圆形的周边。 该装置具有抛光垫，该抛光垫具有用于接触和抛光基底的下表面的上抛光表面。 保持器具有向内的保持面，用于在衬底的抛光期间接合和保持衬底以防止横向移动。 保持面在沿着周边的基本上一个单独的离散圆周位置处接合基底周边。