公开(公告)号：US09196498B1

公开(公告)日：2015-11-24

申请号：US14458021

申请日：2014-08-12

申请人： Roy C. Nangoy

发明人： Roy C. Nangoy

IPC分类号： H01L21/306 ,  H01L21/3065 ,  H01J37/32 ,  H01L21/78 ,  H01L23/544 ,  H01L21/67 ,  H01L21/683 ,  H01L21/673

CPC分类号： H01L21/6836 ,  H01J37/32522 ,  H01J37/32568 ,  H01J37/32642 ,  H01J37/32651 ,  H01J37/32724 ,  H01J2237/002 ,  H01J2237/024 ,  H01J2237/334 ,  H01L21/3065 ,  H01L21/3081 ,  H01L21/31105 ,  H01L21/31127 ,  H01L21/32131 ,  H01L21/67069 ,  H01L21/67109 ,  H01L21/67207 ,  H01L21/673 ,  H01L21/6831 ,  H01L21/78 ,  H01L23/544 ,  H01L2221/68327 ,  H01L2221/68377 ,  H01L2223/5446 ,  H01L2924/0002 ,  H01L2924/00

摘要： Methods of and apparatuses for dicing semiconductor wafers, each wafer having a plurality of integrated circuits, are described. In an example, a plasma processing apparatus includes a processing chamber having a chamber wall. The plasma processing apparatus also includes a plasma source in an upper portion of the processing chamber. A sample support is included for situating a sample below the plasma source. An actively-cooled shadow ring having a cooling channel therein for cooling fluid transport is fixedly attached to the chamber wall of the processing chamber, between the plasma source and the sample support.

摘要翻译： 对具有多个集成电路的各晶片的切割半导体晶片的方法和装置进行说明。 在一个示例中，等离子体处理设备包括具有室壁的处理室。 等离子体处理装置还包括在处理室的上部的等离子体源。 包括样品支架，用于将样品置于等离子体源下方。 其中具有用于冷却流体输送的冷却通道的主动冷却的阴影环在等离子体源和样品支架之间固定地附接到处理室的室壁。

公开(公告)号：US08096852B2

公开(公告)日：2012-01-17

申请号：US12187637

申请日：2008-08-07

申请人： Sameer Deshpande ,  Shou-Sung Chang ,  Hung Chih Chen ,  Roy C Nangoy ,  Stan D Tsai

发明人： Sameer Deshpande ,  Shou-Sung Chang ,  Hung Chih Chen ,  Roy C Nangoy ,  Stan D Tsai

IPC分类号： B24B49/18

CPC分类号： B24B49/18 ,  B24B37/005 ,  B24B49/16 ,  B24B53/017

摘要： Polishing pads used in CMP machines are consumable components that are typically replaced after a specific number of wafers have been processed. The life of a polishing pad is optimized by controlling the rate of material removal from the polishing pad by the conditioning disk. The conditioning disk removes enough material so the polishing surface can properly process the wafers but does not remove any excess material. Preventing excess material removal extends the life of the polishing pad. During CMP processing, the controller receives data concerning the torque applied to the conditioning disk and the torque applied to the arm to sweep the conditioning disk across the polishing pad. Based upon the detected operating conditions, the system can predict the rate of material removal and adjust the forces applied to the conditioning disk so that the life of the polishing pad is optimized.

摘要翻译： 在CMP机器中使用的抛光垫是可消耗的部件，通常在处理特定数量的晶片之后被替换。 抛光垫的寿命通过控制由调节盘从抛光垫去除的材料的速率被优化。 调节盘移除足够的材料，因此抛光表面可以适当地处理晶片，但不会去除任何多余的材料。 防止多余的材料去除延长了抛光垫的寿命。 在CMP处理期间，控制器接收关于施加到调节盘的扭矩和施加到臂上的扭矩以扫掠经过抛光垫的调节盘的数据。 基于检测到的操作条件，系统可以预测材料去除速率并调节施加到调节盘的力，以便抛光垫的寿命被优化。

公开(公告)号：US07433759B2

公开(公告)日：2008-10-07

申请号：US10898301

申请日：2004-07-23

申请人： Roy C. Nangoy

发明人： Roy C. Nangoy

IPC分类号： G06F19/00

CPC分类号： H01L21/681

摘要： A method for calibrating a controller of a robotic arm in a microelectronics manufacturing apparatus that includes storing a default position for an edge detector, moving a blade on the robotic arm based on the default position of the edge detector such that at least three edge points on the blade pass through and are detected by the edge detector, generating a plurality of arm position measurements from an arm position sensor by measuring a position with the arm position sensor of the robotic arm at each position of the robotic arm at which an edge point of the blade is detected by the edge detector, and determining at least one of an actual position of the edge detector and an offset for measurements of the arm position sensor based on the plurality of arm position measurements.

摘要翻译： 一种用于校准微电子制造装置中的机器人臂的控制器的方法，其包括存储用于边缘检测器的默认位置，基于边缘检测器的默认位置移动机器人臂上的刀片，使得至少三个边缘点在 刀片通过并由边缘检测器检测，通过在机器人臂的每个位置处测量与机器人臂的臂位置传感器的位置，从臂位置传感器产生多个臂位置测量，其中边缘点 刀片由边缘检测器检测，并且基于多个臂位置测量来确定边缘检测器的实际位置和用于臂位置传感器的测量的偏移中的至少一个。

公开(公告)号：US09305810B2

公开(公告)日：2016-04-05

申请号：US13456006

申请日：2012-04-25

申请人： Saravjeet Singh ,  Roy C. Nangoy

发明人： Saravjeet Singh ,  Roy C. Nangoy

IPC分类号： F17D1/00 ,  H01L21/67

CPC分类号： H01L21/67017 ,  H01L21/6719 ,  Y10T137/0318 ,  Y10T137/87096

摘要： Embodiments of the invention relate to a gas delivery system. The gas delivery system includes a fast gas exchange module in fluid communication with one or more gas panels and a process chamber. The fast gas exchange module has first and second sets of flow controllers and each of first and second sets of flow controllers has multiple flow controllers. The flow controller is configured such that each of the flow controllers in the first and second sets of the flow controllers is independently operated to selectively open to divert gas to the process chamber or an exhaust. The first and second sets of flow controllers are operated for synchronized switching of gases in a pre-determined timed sequence of flow controller actuation. The invention enables fast switch of resultant gas flow in the process chamber while having individual flow controller operated at lower switching speed to provide longer service life.

摘要翻译： 本发明的实施例涉及一种气体输送系统。 气体输送系统包括与一个或多个气体板和处理室流体连通的快速气体交换模块。 快速气体交换模块具有第一和第二组流量控制器，并且第一和第二组流量控制器中的每一个具有多个流量控制器。 流量控制器被配置为使得第一和第二组流量控制器中的每个流量控制器被独立地操作以选择性地打开以将气体转移到处理室或排气口。 第一和第二组流量控制器用于以预定的流量控制器致动的定时顺序同步切换气体。 本发明能够在处理室中快速切换合成气流，同时具有以较低切换速度操作的各个流量控制器以提供更长的使用寿命。

公开(公告)号：US20130284700A1

公开(公告)日：2013-10-31

申请号：US13790735

申请日：2013-03-08

申请人： Roy C. NANGOY ,  Andrew Y. NGUYEN

发明人： Roy C. NANGOY ,  Andrew Y. NGUYEN

IPC分类号： B05B1/18

CPC分类号： B05B1/185 ,  B01F15/0264 ,  C23C16/45563 ,  C23C16/45565 ,  C23C16/45578 ,  H01J37/32119 ,  H01J37/3244 ,  H01J37/32449 ,  H01L21/67069

摘要： Embodiments of the present invention relate to method and apparatus for providing processing gases to a process chamber with improved uniformity. One embodiment of the present invention provides a gas injection assembly. The gas injection assembly includes an inlet hub, a nozzle having a plurality of injection passages disposed against the inlet hub, and a distribution insert disposed between the nozzle and the inlet hub. The distribution insert has one or more gas distribution passages configured to connect the inlet hub to the plurality of the injection passages the nozzle. Each of the one or more gas distribution passages has one inlet connecting with a plurality of outlets, and distances between the inlet and each of the plurality of outlets are substantially equal.

摘要翻译： 本发明的实施例涉及用于向处理室提供具有改进的均匀性的处理气体的方法和装置。 本发明的一个实施例提供一种气体注入组件。 气体注入组件包括入口轮毂，具有多个设置在入口轮毂上的喷射通道的喷嘴以及设置在喷嘴和入口轮毂之间的分配插入件。 分配插件具有一个或多个气体分配通道，其构造成将入口轮毂连接到喷嘴的多个喷射通道。 一个或多个气体分配通道中的每一个具有与多个出口连接的一个入口，并且多个出口中的入口与每个出口之间的距离基本相等。

公开(公告)号：US20090036036A1

公开(公告)日：2009-02-05

申请号：US12245759

申请日：2008-10-05

申请人： Roy C. Nangoy ,  Shou-Sung Chang ,  Donald J.K. Olgado ,  Hung Chih Chen ,  Gerald John Alonzo

发明人： Roy C. Nangoy ,  Shou-Sung Chang ,  Donald J.K. Olgado ,  Hung Chih Chen ,  Gerald John Alonzo

IPC分类号： B24B53/02

CPC分类号： B24B53/017 ,  B24B53/005 ,  B24B53/12

摘要： Apparatus and methods for conditioning a polishing pad are provided. An apparatus includes a base, an arm adapted to support a conditioning disk; and a drive mechanism coupled between the arm and the conditioning disk, wherein the drive mechanism is adapted to directly rotate the conditioning disk relative to the arm. Numerous other aspects are disclosed.

摘要翻译： 提供了用于调节抛光垫的装置和方法。 一种装置包括底座，适于支撑调节盘的臂; 以及联接在所述臂和所述调节盘之间的驱动机构，其中所述驱动机构适于相对于所述臂直接旋转所述调节盘。 公开了许多其他方面。

公开(公告)号：US20110318997A1

公开(公告)日：2011-12-29

申请号：US13164733

申请日：2011-06-20

申请人： Roy C. Nangoy ,  Shou-Sung Chang ,  Donald J. K. Olgado ,  Hung Chih Chen ,  Gerald John Alonzo

发明人： Roy C. Nangoy ,  Shou-Sung Chang ,  Donald J. K. Olgado ,  Hung Chih Chen ,  Gerald John Alonzo

IPC分类号： B24B1/00

CPC分类号： B24B53/017 ,  B24B53/005 ,  B24B53/12

摘要： Apparatus and methods for conditioning a polishing pad include an arm adapted to support a conditioning disk; a drive mechanism coupled to the arm; and a flexible coupling between the drive mechanism and the conditioning disk adapted to allow the conditioning disk to tilt while transmitting rotary motion from the drive mechanism to the conditioning disk. Numerous other aspects are disclosed.

摘要翻译： 用于调理抛光垫的装置和方法包括适于支撑调节盘的臂; 联接到所述臂的驱动机构; 以及驱动机构和调节盘之间的柔性联接件，其适于允许调节盘在将驱动机构的旋转运动传递到调节盘的同时倾斜。 公开了许多其他方面。

公开(公告)号：US20090272717A1

公开(公告)日：2009-11-05

申请号：US12407548

申请日：2009-03-19

申请人： Sharma V. Pamarthy ,  Jon C. Farr ,  Khalid Sirajuddin ,  Ezra Robert Gold ,  James P. Cruse ,  Scott Olszewski ,  Roy C. Nangoy ,  Saravjeet Singh ,  Douglas A. Buchberger, JR. ,  Jared Ahmad Lee ,  Chunlei Zhang

发明人： Sharma V. Pamarthy ,  Jon C. Farr ,  Khalid Sirajuddin ,  Ezra Robert Gold ,  James P. Cruse ,  Scott Olszewski ,  Roy C. Nangoy ,  Saravjeet Singh ,  Douglas A. Buchberger, JR. ,  Jared Ahmad Lee ,  Chunlei Zhang

IPC分类号： C23F1/00

CPC分类号： H01L21/30655 ,  Y10T137/0318 ,  Y10T137/87169

摘要： Embodiments of the invention relate to a substrate etching system and process. In one embodiment, a method may include depositing material on the substrate during a deposition process, etching a first layer of the substrate during a first etch process, and etching a second layer of the substrate during a second etch process, wherein a first bias power is applied to the substrate during the first process, and wherein a second bias power is applied to the substrate during the second etch process. In another embodiment, a system may include a gas delivery system containing a first gas panel for supplying a first gas to a chamber, a second gas panel for supplying a second gas to the chamber, and a plurality of flow controllers for directing the gases to the chamber to facilitate rapid gas transitioning between the gases to and from the chamber and the panels.

摘要翻译： 本发明的实施例涉及一种基板蚀刻系统和工艺。 在一个实施例中，一种方法可以包括在沉积工艺期间在衬底上沉积材料，在第一蚀刻工艺期间蚀刻衬底的第一层，以及在第二蚀刻工艺期间蚀刻衬底的第二层，其中第一偏置功率 在第一工艺期间施加到衬底，并且其中在第二蚀刻工艺期间将第二偏压功率施加到衬底。 在另一个实施例中，系统可以包括气体输送系统，其包含用于向腔室供应第一气体的第一气体面板，用于向腔室供应第二气体的第二气体面板，以及用于将气体引导到 该室用于促进在进出室和面板之间的气体之间的快速气体转变。

公开(公告)号：US20090036035A1

公开(公告)日：2009-02-05

申请号：US12245758

申请日：2008-10-05

申请人： Roy C. Nangoy ,  Shou-Sung Chang ,  Donald J.K. Olgado ,  Hung Chih Chen ,  Gerald John Alonzo

发明人： Roy C. Nangoy ,  Shou-Sung Chang ,  Donald J.K. Olgado ,  Hung Chih Chen ,  Gerald John Alonzo

IPC分类号： B24B1/00 ,  B24B7/00

CPC分类号： B24B53/017 ,  B24B53/005 ,  B24B53/12

摘要： Apparatus and methods for conditioning a polishing pad include a base, an arm pivotally coupled to the base and adapted to support a conditioning disk, and an actuator coupled to the base and the arm. The actuator is adapted to cause the arm to press the conditioning disk against the polishing pad with a linearly variable amount of force. A first force is produced with the actuator. The first force is scaled by a linearly variable amount to a second force that is applied to the polishing pad by a conditioning disk. Numerous other aspects are disclosed.

摘要翻译： 用于调理抛光垫的装置和方法包括基座，枢转地联接到基座并适于支撑调节盘的臂以及联接到基座和臂的致动器。 致动器适于使臂以线性可变量的力将调节盘压靠抛光垫。 用致动器产生第一力。 第一力通过线性可变量被缩放到通过调节盘施加到抛光垫的第二力。 公开了许多其他方面。

公开(公告)号：US20080156360A1

公开(公告)日：2008-07-03

申请号：US11961587

申请日：2007-12-20

申请人： Donald J.K. Olgado ,  Sheshraj L. Tulshibagwale ,  Thomas B. Brezoczky ,  John S. Lewis ,  Ho Seon Shin ,  Hui Chen ,  Roy C. Nangoy

发明人： Donald J.K. Olgado ,  Sheshraj L. Tulshibagwale ,  Thomas B. Brezoczky ,  John S. Lewis ,  Ho Seon Shin ,  Hui Chen ,  Roy C. Nangoy

IPC分类号： B08B3/00

CPC分类号： B08B3/00 ,  B08B3/04 ,  B08B3/12

摘要： Embodiments of the present invention relate to semiconductor device manufacturing, and more particularly to a horizontal megasonic module for cleaning substrates. In one embodiment an apparatus for cleaning a substrate is provided. The apparatus comprises a tank adapted to contain a cleaning fluid, a movable housing having a first side adapted to be placed in the cleaning fluid, a plurality of rotatable rollers coupled to the first side of the housing, the rollers positioned and including grooves to securely hold the substrate in a horizontal orientation, and one or more transducers adapted to direct vibrational energy through the cleaning fluid in the tank toward the substrate, wherein at least one of the transducers directs vibrational energy toward the substrate and substantially parallel to a major surface of the substrate.

摘要翻译： 本发明的实施例涉及半导体器件制造，更具体地涉及用于清洁衬底的水平兆声模块。 在一个实施例中，提供了一种用于清洁基底的装置。 该设备包括适于容纳清洁流体的罐，具有适于放置在清洁流体中的第一侧的可移动壳体，与壳体的第一侧耦合的多个可旋转辊，辊定位并包括槽以牢固地 将所述基板保持在水平方向，以及一个或多个换能器，其适于将振动能量引导通过所述罐中的所述清洁流体朝向所述基板，其中所述换能器中的至少一个将振动能量引向所述基板并基本上平行于 底物。