发明申请
- 专利标题： ULTRAVIOLET REFLECTOR WITH COOLANT GAS HOLES AND METHOD
- 专利标题（中）： 具有冷却气体的超紫外反射器和方法
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申请号： US12255609申请日： 2008-10-21
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公开(公告)号： US20100096564A1公开(公告)日： 2010-04-22
- 发明人: Yao-Hung Yang , Tuan Anh Nguyen , Sanjeev Baluja , Andrzej Kaszuba , Juan Carlos Rocha , Thomas Nowak , Dustin W. Ho
- 申请人： Yao-Hung Yang , Tuan Anh Nguyen , Sanjeev Baluja , Andrzej Kaszuba , Juan Carlos Rocha , Thomas Nowak , Dustin W. Ho
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 主分类号： G21K1/06
- IPC分类号： G21K1/06 ; G21K5/00
摘要：
A reflector for an ultraviolet lamp can be used in a substrate processing apparatus. The reflector comprises a longitudinal strip extending the length of the ultraviolet lamp. The longitudinal strip has a curved reflective surface and comprises a plurality of through holes to direct a coolant gas toward the ultraviolet lamp. A chamber that uses an ultraviolet lamp module with the reflector, and a method of ultraviolet treatment are also described.
公开/授权文献
- US07964858B2 Ultraviolet reflector with coolant gas holes and method 公开/授权日：2011-06-21
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