发明申请
- 专利标题： PHOTOSENSITIVE RESIN AND PROCESS FOR PRODUCING MICROLENS
- 专利标题（中）： 感光树脂和生产微生物的方法
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申请号： US12451474申请日： 2008-05-14
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公开(公告)号： US20100096663A1公开(公告)日： 2010-04-22
- 发明人: Takayuki Negi , Takahiro Sakaguchi , Takahiro Kishioka
- 申请人： Takayuki Negi , Takahiro Sakaguchi , Takahiro Kishioka
- 申请人地址： JP TOKYO
- 专利权人： NISSAN CHEMICAL INDUSTRIES, LTD.
- 当前专利权人： NISSAN CHEMICAL INDUSTRIES, LTD.
- 当前专利权人地址： JP TOKYO
- 优先权： JP2007-131444 20070517
- 国际申请： PCT/JP2008/058860 WO 20080514
- 主分类号： H01L33/00
- IPC分类号： H01L33/00 ; G03F7/004 ; G03F7/20 ; H01L31/0232
摘要：
A material for a microlens having heat resistance, high resolution and high light-extraction efficiency is provided. A positive resist composition comprises an alkali-soluble polymer (A) containing a unit structure having an aromatic fused ring or a derivative thereof, and a compound (B) having an organic group which undergoes photodecomposition to yield an alkali-soluble group. The positive resist composition has coating film properties of a refractive index at a wavelength of 633 nm of 1.6 or more and a transmittance at wavelengths of 400 to 730 nm of 80% or more. A pattern forming method comprises applying the positive resist composition, drying the composition, exposing the composition to light, and developing the composition.
公开/授权文献
- US08940470B2 Photosensitive resin and process for producing microlens 公开/授权日：2015-01-27
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