发明申请
US20100103392A1 Immersion exposure device cleaning method, dummy wafer, and immersion exposure device
审中-公开
浸渍曝光装置清洗方法，虚拟晶片和浸渍曝光装置
- 专利标题： Immersion exposure device cleaning method, dummy wafer, and immersion exposure device
- 专利标题（中）： 浸渍曝光装置清洗方法，虚拟晶片和浸渍曝光装置
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申请号： US12588618申请日： 2009-10-21
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公开(公告)号： US20100103392A1公开(公告)日： 2010-04-29
- 发明人: Yoshinori Matsui , Naka Onoda
- 申请人： Yoshinori Matsui , Naka Onoda
- 申请人地址： JP Kawasaki-shi
- 专利权人： NEC ELECTRONICS CORPORATION
- 当前专利权人： NEC ELECTRONICS CORPORATION
- 当前专利权人地址： JP Kawasaki-shi
- 优先权： JP2008-274630 20081024
- 主分类号： G03B27/52
- IPC分类号： G03B27/52
摘要：
The immersion exposure device cleaning method according to the invention includes: placing a dummy wafer onto a stage of the immersion exposure device; and moving the stage while maintaining an immersion solution between the dummy wafer and a projector lens. The dummy wafer includes a substrate and an adsorption area that is formed on the substrate and has higher adsorption power for particles suspended in the supplied immersion solution than the substrate has for the particles.
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