发明申请
US20100104852A1 Fabrication of High-Throughput Nano-Imprint Lithography Templates
审中-公开
高通量纳米压印光刻模板的制作
- 专利标题： Fabrication of High-Throughput Nano-Imprint Lithography Templates
- 专利标题（中）： 高通量纳米压印光刻模板的制作
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申请号： US12604094申请日： 2009-10-22
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公开(公告)号： US20100104852A1公开(公告)日： 2010-04-29
- 发明人: Edward B. Fletcher , Frank Y. Xu , Weijun Liu , Fen Wan , Marlon Menezes , Kosta S. Selinidis
- 申请人： Edward B. Fletcher , Frank Y. Xu , Weijun Liu , Fen Wan , Marlon Menezes , Kosta S. Selinidis
- 申请人地址： US TX Austin
- 专利权人： MOLECULAR IMPRINTS, INC.
- 当前专利权人： MOLECULAR IMPRINTS, INC.
- 当前专利权人地址： US TX Austin
- 主分类号： B32B3/26
- IPC分类号： B32B3/26 ; B05D3/10 ; B01D3/00 ; C23C16/00 ; B05D3/06
摘要：
An imprint lithography template includes a porous material defining a multiplicity of pores with an average pore size of at least about 0.4 nm. The porous material includes silicon and oxygen, and a ratio of Young's modulus (E) to relative density of the porous material with respect to fused silica (pporous/pfused silica) is at least about 10:1. A refractive index of the porous material is between about 1.4 and 1.5. The porous material may form an intermediate layer or a cap layer of an imprint lithography template. The template may include a pore seal layer between a porous layer and a cap layer, or a pore seal layer on top of a cap layer.
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