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    Method of providing desirable wetting and release characteristics between a mold and a polymerizable composition
    1.
    发明授权
    Method of providing desirable wetting and release characteristics between a mold and a polymerizable composition 有权
    在模具和可聚合组合物之间提供所需的润湿和释放特性的方法

    公开(公告)号：US07837921B2

    公开(公告)日：2010-11-23

    申请号：US11244428

    申请日：2005-10-05

    申请人： Frank Y. Xu ,  Pankaj B. Lad ,  Ian M. McMackin ,  Van N. Truskett ,  Edward B. Fletcher

    发明人： Frank Y. Xu ,  Pankaj B. Lad ,  Ian M. McMackin ,  Van N. Truskett ,  Edward B. Fletcher

    IPC分类号： B28B7/36 ,  B28B11/10 ,  G03C1/00

    CPC分类号： G03F7/0002 ,  B41C1/10 ,  B41M7/0072 ,  B41M7/0081 ,  B82Y10/00 ,  B82Y30/00 ,  B82Y40/00 ,  Y10S977/887

    摘要： The present invention provides a method that features improved wetting characteristics while allowing preferential adhesion and release characteristics with respect to a substrate and a mold having imprinting material disposed therebetween. The method includes coating a surface of the mold with a volume of surfactant containing solution. The surfactant in the solution includes a hydrophobic component consisting essentially of a plurality of fluorine-containing molecules. The distribution of the plurality of the fluorine atoms in the fluorine-containing molecules, as well as the fluorine-containing molecules throughout the volume provides a desired contact angle with respect to a polymerizable composition disposed on the substrate. The contact angle is in a range of 50° or less.

    摘要翻译： 本发明提供了一种具有改进的润湿特性的方法，同时允许相对于基材和在其之间设置有压印材料的模具的优先粘合和释放特性。 该方法包括用一定体积的含表面活性剂的溶液涂覆模具的表面。 溶液中的表面活性剂包括基本上由多个含氟分子组成的疏水组分。 含氟分子中的多个氟原子的分布以及整个体积中的含氟分子相对于设置在基材上的可聚合组合物提供期望的接触角。 接触角在50°以下的范围内。

    PHOTOCATALYTIC REACTIONS IN NANO-IMPRINT LITHOGRAPHY PROCESSES
    5.
    发明申请
    PHOTOCATALYTIC REACTIONS IN NANO-IMPRINT LITHOGRAPHY PROCESSES 有权
    纳米印刷方法中的光催化反应

    公开(公告)号：US20120201969A1

    公开(公告)日：2012-08-09

    申请号：US13446364

    申请日：2012-04-13

    申请人： Edward B. Fletcher ,  Frank Y. Xu

    发明人： Edward B. Fletcher ,  Frank Y. Xu

    IPC分类号： C08F2/46 ,  C08J7/04 ,  B29C59/02

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    摘要： An imprint lithography template having a photoactive coating adhered to a surface of the template. Irradiation of the photoactive coating promotes cleaning of the template by decomposition of organic material proximate the template (e.g., organic material adsorbed on the template). An imprint lithography system may be configured such that template cleaning is achieved during formation of a patterned layer on an imprint lithography substrate. Cleaning of the template during an imprint lithography process reduces down-time that may be associated with template maintenance.

    摘要翻译： 具有粘附到模板表面的光敏涂层的压印光刻模板。 光活性涂层的照射通过分散模板附近的有机材料（例如吸附在模板上的有机材料）促进模板的清洁。 压印光刻系统可以被配置为使得在压印光刻基板上形成图案化层期间实现模板清洁。 在压印光刻工艺期间清洁模板减少了可能与模板维护相关的停机时间。

    PHOTOCATALYTIC REACTIONS IN NANO-IMPRINT LITHOGRAPHY PROCESSES
    7.
    发明申请
    PHOTOCATALYTIC REACTIONS IN NANO-IMPRINT LITHOGRAPHY PROCESSES 审中-公开
    纳米印刷方法中的光催化反应

    公开(公告)号：US20100109205A1

    公开(公告)日：2010-05-06

    申请号：US12612129

    申请日：2009-11-04

    申请人： Edward B. Fletcher ,  Frank Y. Xu

    发明人： Edward B. Fletcher ,  Frank Y. Xu

    IPC分类号： B29C59/16 ,  B29C59/00

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    摘要： An imprint lithography template having a photoactive coating adhered to a surface of the template. Irradiation of the photoactive coating promotes cleaning of the template by decomposition of organic material proximate the template (e.g., organic material adsorbed on the template). An imprint lithography system may be configured such that template cleaning is achieved during formation of a patterned layer on an imprint lithography substrate. Cleaning of the template during an imprint lithography process reduces down-time that may be associated with template maintenance.

    摘要翻译： 具有粘附到模板表面的光敏涂层的压印光刻模板。 光活性涂层的照射通过分散模板附近的有机材料（例如吸附在模板上的有机材料）促进模板的清洁。 压印光刻系统可以被配置为使得在压印光刻基板上形成图案化层期间实现模板清洁。 在压印光刻工艺期间清洁模板减少了可能与模板维护相关的停机时间。

    Fabrication of High-Throughput Nano-Imprint Lithography Templates
    8.
    发明申请
    Fabrication of High-Throughput Nano-Imprint Lithography Templates 审中-公开
    高通量纳米压印光刻模板的制作

    公开(公告)号：US20140212534A1

    公开(公告)日：2014-07-31

    申请号：US13754015

    申请日：2013-01-30

    申请人： Edward B. Fletcher ,  Frank Y. Xu ,  Weijun Liu ,  Fen Wan ,  Marlon Menezes ,  Kosta S. Selinidis

    发明人： Edward B. Fletcher ,  Frank Y. Xu ,  Weijun Liu ,  Fen Wan ,  Marlon Menezes ,  Kosta S. Selinidis

    IPC分类号： B29C59/02 ,  C23C16/40

    CPC分类号： C23C16/401 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

    摘要： An imprint lithography template includes a porous material defining a multiplicity of pores with an average pore size of at least about 0.4 nm. The porous material includes silicon and oxygen, and a ratio of Young's modulus (E) to relative density of the porous material with respect to fused silica (ρporous/ρfused silica) is at least about 10:1. A refractive index of the porous material is between about 1.4 and 1.5. The porous material may form an intermediate layer or a cap layer of an imprint lithography template. The template may include a pore seal layer between a porous layer and a cap layer, or a pore seal layer on top of a cap layer.

    摘要翻译： 压印光刻模板包括限定平均孔径至少约0.4nm的多个孔的多孔材料。 多孔材料包括硅和氧，并且杨氏模量（E）与多孔材料相对于熔融二氧化硅（“多孔/熔融二氧化硅”）的相对密度之比至少为约10:1。 多孔材料的折射率在约1.4和1.5之间。 多孔材料可以形成压印光刻模板的中间层或盖层。 模板可以包括在多孔层和盖层之间的孔密封层，或者在盖层的顶部上的孔密封层。