The present invention provides for two separate processes for removing impurities from an organic solvent based ruthenium precursor. The first process comprises the steps of contacting the organic solvent based ruthenium precursor with one or more drying agents under an inert gas blanket for a sufficient period of time to allow at least a portion of the impurities in the organic solvent based ruthenium precursor to be adsorbed by the one or more drying agents; and separating the one or more drying agents which have at least a portion of the impurities adsorbed thereon from the organic solvent based ruthenium precursor. The second process comprises the steps of providing a column that contains one or more drying agents and is equipped with a filtration unit; passing the organic solvent based ruthenium precursor through the column in order to allow at least a portion of the impurities in the solvent based ruthenium precursor to be adsorbed by the one or more drying agents, said passing of the solvent based ruthenium precursor taking place under a blanket of inert gas; and further passing the ruthenium precursor through the filtration unit in order ro remove any residual particles that may result from the passage of the ruthenium precursor through the column containing the one or more drying agents in order to obtain a purified ruthenium precursor.