发明申请
- 专利标题: FILM DEPOSITION APPARATUS
- 专利标题(中): 胶片沉积装置
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申请号: US12627144申请日: 2009-11-30
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公开(公告)号: US20100132615A1公开(公告)日: 2010-06-03
- 发明人: HITOSHI KATO , Manabu Honma
- 申请人: HITOSHI KATO , Manabu Honma
- 专利权人: TOKYO ELECTRON LIMITED
- 当前专利权人: TOKYO ELECTRON LIMITED
- 优先权: JP2008-307825 20081202
- 主分类号: C23C16/46
- IPC分类号: C23C16/46 ; C23C16/00
摘要:
In a film deposition apparatus, a first separation gas is discharged from a separation gas supplying portion to a separation area between a first process area to which a first reaction gas is supplied and a second process area to which a second reaction gas is supplied. A heater is provided to heat the turntable by radiation heat. An outer sidewall member is provided in a bottom part of a vacuum chamber to surround the turntable in an area where the heater is provided. A space forming member is provided between the separation areas adjacent to each other in a rotating direction of the turntable and extending from the outer sidewall member to form a narrow space between the turntable. A purge gas flows from a lower side of the turntable to an area outside the turntable in a radial direction through the narrow space.
公开/授权文献
- US09103030B2 Film deposition apparatus 公开/授权日:2015-08-11