发明申请
- 专利标题： DOSIMETRY IMPLANT FOR TREATING RESTENOSIS AND HYPERPLASIA
- 专利标题（中）： 用于治疗抑郁症和高血压的药物植入物
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申请号： US11758937申请日： 2007-06-06
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公开(公告)号： US20100137673A1公开(公告)日： 2010-06-03
- 发明人: Suresh Srivastava , Gilbert R. Gonzales , Roger W. Howell , Wesley E. Bolch , Radoslav Adzic
- 申请人： Suresh Srivastava , Gilbert R. Gonzales , Roger W. Howell , Wesley E. Bolch , Radoslav Adzic
- 主分类号： A61M36/04
- IPC分类号： A61M36/04 ; A61F2/82
摘要：
The present invention discloses a method of selectively providing radiation dosimetry to a subject in need of such treatment. The radiation is applied by an implant comprising a body member and 117mSn electroplated at selected locations of the body member, emitting conversion electrons absorbed immediately adjacent selected locations while not affecting surrounding tissue outside of the immediately adjacent area.
公开/授权文献
- US08834338B2 Dosimetry implant for treating restenosis and hyperplasia 公开/授权日：2014-09-16
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