发明申请
- 专利标题: METHOD FOR FORMING FINE PATTERNS
- 专利标题(中): 形成精细图案的方法
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申请号: US12595683申请日: 2008-04-14
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公开(公告)号: US20100139513A1公开(公告)日: 2010-06-10
- 发明人: Jie-Hyun Seong , Seung-Heon Lee , Young-Jun Hong , Ji-Su Kim
- 申请人: Jie-Hyun Seong , Seung-Heon Lee , Young-Jun Hong , Ji-Su Kim
- 申请人地址: KR Seoul
- 专利权人: LG CHEM, LTD.
- 当前专利权人: LG CHEM, LTD.
- 当前专利权人地址: KR Seoul
- 优先权: KR10-2007-0036402 20070413
- 国际申请: PCT/KR08/02094 WO 20080414
- 主分类号: B41F3/34
- IPC分类号: B41F3/34
摘要:
A method for forming fine patterns includes (S1) closely contacting a cliche-forming film to a hard mold concavely patterned, thereby making a disposable cliche; (S2) coating an elastic blanket cylinder with ink or resin; (S3) compressing the elastic blanket cylinder to the disposable cliche to remove ink or resin on a surface of the elastic blanket cylinder at a portion contacting with a relatively protruded embossed portion of the disposable cliche; and (S4) transcribing ink or resin remaining on the surface of the elastic blanket cylinder to a substrate. This method allows simple and fast works and greatly reduces costs by adopting a disposable cliche that may be easily installed and removed. Also, this method may be effectively utilized to form a fine pattern of an electronic device or a display device such as color filter and electrode.