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    Conductive substrate and touch screen having same
    3.
    发明授权
    Conductive substrate and touch screen having same 有权
    导电基板和具有相同的触摸屏

    公开(公告)号：US09363888B2

    公开(公告)日：2016-06-07

    申请号：US14008522

    申请日：2012-03-28

    申请人： Ji Young Hwang ,  In-Seok Hwang ,  Seung Heon Lee ,  Sang Ki Chun ,  Yong Goo Son ,  Beom Mo Koo ,  Jiehyun Seong ,  Joo Yeon Kim ,  Je Seob Park

    发明人： Ji Young Hwang ,  In-Seok Hwang ,  Seung Heon Lee ,  Sang Ki Chun ,  Yong Goo Son ,  Beom Mo Koo ,  Jiehyun Seong ,  Joo Yeon Kim ,  Je Seob Park

    IPC分类号： G06F3/041 ,  H05K1/02 ,  G02F1/1333

    CPC分类号： H05K1/0274 ,  G02F1/13338 ,  G06F3/044 ,  G06F2203/04103 ,  G06F2203/04112

    摘要： The present invention relates to a conducting substrate and a touch screen comprising the same, and the conducting substrate according to the present invention comprises a board, an electric conducting pattern provided on at least one surface of the board, and a darkening layer provided on at least one surface of the electric conducting pattern and in a region corresponding to the electric conducting pattern, wherein a reflective diffraction intensity of a reflective diffraction image obtained by radiating light emitted from a point light source on one surface from which the darkening layer is visible is reduced by 60% or more as compared to the conducting substrate having the same constitution except that the electric conducting pattern is formed of Al and does not comprise the darkening layer.

    摘要翻译： 本发明涉及导电基板和包括该导电基板的触摸屏，并且根据本发明的导电基板包括板，设置在板的至少一个表面上的导电图案，以及设置在其上的变暗层 导电图案的至少一个表面和对应于导电图案的区域中，其中通过在可见光的一个表面辐射从点光源发射的光而获得的反射衍射图像的反射衍射强度为 与具有相同结构的导电基板相比，除了导电图案由Al形成并且不包括变色层之外，减少了60％以上。

    Touch screen and method for manufacturing the same
    6.
    发明授权
    Touch screen and method for manufacturing the same 有权
    触摸屏及其制造方法

    公开(公告)号：US08822865B2

    公开(公告)日：2014-09-02

    申请号：US13338680

    申请日：2011-12-28

    申请人： Ji Young Hwang ,  In-Seok Hwang ,  Seung Heon Lee ,  Sang Ki Chun ,  Hyun Sik Kim ,  Yong Goo Son ,  Beom Mo Koo ,  Mi Kyoung Kim ,  Joonhyung Kim

    发明人： Ji Young Hwang ,  In-Seok Hwang ,  Seung Heon Lee ,  Sang Ki Chun ,  Hyun Sik Kim ,  Yong Goo Son ,  Beom Mo Koo ,  Mi Kyoung Kim ,  Joonhyung Kim

    IPC分类号： H03K17/975

    CPC分类号： G06F3/044

    摘要： Provided are a single-sided one-sheet type capacitive touch screen and a method for manufacturing the same. The touch screen includes: a substrate; a first conductive pattern disposed on the substrate in a vertical direction and including at least two pattern columns having two or more conductive pattern regions electrically connected with each other; a second conductive pattern disposed on the same surface of the substrate as the surface where the first conductive pattern is disposed, not being electrically connected with the first conductive pattern, and including two or more conductive pattern regions not electrically connected with each other; a transparent conductive bridge electrically connecting the conductive pattern regions of the second conductive pattern in a horizontal direction; and a transparent insulating part disposed between the transparent conductive bridge and the first conductive pattern to electrically insulate the transparent conductive bridge and the first conductive pattern.

    摘要翻译： 提供单面一片式电容式触摸屏及其制造方法。 触摸屏包括：基板; 第一导电图案，其在垂直方向上设置在所述基板上，并且包括具有彼此电连接的两个或更多个导电图案区域的至少两个图案列; 设置在与所述第一导电图案的表面相同的表面上的第二导电图案，不与所述第一导电图案电连接，并且包括彼此不电连接的两个或更多个导电图案区域; 将第二导电图案的导电图案区域沿水平方向电连接的透明导电桥， 以及透明绝缘部件，其设置在所述透明导电桥和所述第一导电图案之间，以使所述透明导电桥和所述第一导电图案电绝缘。

    METHOD OF FABRICATING A SEMICONDUCTOR DEVICE
    9.
    发明申请
    METHOD OF FABRICATING A SEMICONDUCTOR DEVICE 审中-公开
    制造半导体器件的方法

    公开(公告)号：US20130095637A1

    公开(公告)日：2013-04-18

    申请号：US13586325

    申请日：2012-08-15

    申请人： Honggun KIM ,  Seung-Heon Lee ,  Mansug Kang ,  ByeongJu Bae ,  Eunkee Hong

    发明人： Honggun KIM ,  Seung-Heon Lee ,  Mansug Kang ,  ByeongJu Bae ,  Eunkee Hong

    IPC分类号： H01L21/762

    CPC分类号： H01L21/76229

    摘要： A method of fabricating a semiconductor device, the method including forming a mask layer on a semiconductor substrate; forming a trench in the semiconductor substrate using the mask layer as an etch mask; forming a first layer in the trench; and performing a first thermal treatment process on the first layer such that the first thermal treatment process is performed under an atmosphere that includes ozone and water vapor and transforms the first layer into a second layer.

    摘要翻译： 一种制造半导体器件的方法，所述方法包括在半导体衬底上形成掩模层; 在所述半导体衬底中使用所述掩模层作为蚀刻掩模形成沟槽; 在沟槽中形成第一层; 以及在所述第一层上进行第一热处理工艺，使得所述第一热处理工艺在包括臭氧和水蒸气的气氛下进行，并将所述第一层转化为第二层。