Invention Application
- Patent Title: SURFACE TEXTURIZATION METHOD
- Patent Title (中): 表面纹理化方法
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Application No.: US12371634Application Date: 2009-02-16
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Publication No.: US20100147798A1Publication Date: 2010-06-17
- Inventor: Ching-Hsi Lin , Chen-Hsun Du , Chung-Wen Lan
- Applicant: Ching-Hsi Lin , Chen-Hsun Du , Chung-Wen Lan
- Applicant Address: TW Hsinchu
- Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Current Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Current Assignee Address: TW Hsinchu
- Priority: TW97149290 20081217
- Main IPC: B44C1/22
- IPC: B44C1/22

Abstract:
A surface texturization method is provided. First, a polymer film is formed on a substrate. Thereafter, a heating treatment is performed on the substrate. The heating treatment results in a textured polymer film having island-shaped and/or microcrack-shaped patterns. Afterwards, an etching process is performed using the textured polymer film as a mask, so as to remove a portion of the substrate to form a textured structure on the surface of the substrate.
Public/Granted literature
- US08173035B2 Surface texturization method Public/Granted day:2012-05-08
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