发明申请
US20100155624A1 FOCUSED ION BEAM APPARATUS, SAMPLE PROCESSING METHOD USING THE SAME, AND COMPUTER PROGRAM FOR FOCUSED ION BEAM PROCESSING
有权
聚焦离子束装置，使用该方法的样品处理方法和用于聚焦离子束处理的计算机程序
- 专利标题： FOCUSED ION BEAM APPARATUS, SAMPLE PROCESSING METHOD USING THE SAME, AND COMPUTER PROGRAM FOR FOCUSED ION BEAM PROCESSING
- 专利标题（中）： 聚焦离子束装置，使用该方法的样品处理方法和用于聚焦离子束处理的计算机程序
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申请号： US12613107申请日： 2009-11-05
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公开(公告)号： US20100155624A1公开(公告)日： 2010-06-24
- 发明人: Makoto Sato , Masahiro Kiyohara , Junichi Tashiro
- 申请人： Makoto Sato , Masahiro Kiyohara , Junichi Tashiro
- 优先权： JP2008-321821 20081218
- 主分类号： H01J37/08
- IPC分类号： H01J37/08 ; G21K5/04
摘要：
A focused ion beam apparatus includes: a focused ion beam irradiating mechanism configured to irradiate a sample with a focused ion beam; a detector configured to detect a secondary charged particle generated by irradiating the sample with the focused beam; an image generating unit configured to generate an sample image of the sample; a processing area setting unit configured to set a processing area image including a plurality of pixels corresponding to positions of irradiation of the focused ion beam on the sample image; a position of irradiation setting unit configured to set coordinates of the pixels included in the processing area image; a beam setting unit configured to set a dose amount of the focused ion beam irradiated from the focused ion beam irradiating mechanism according to intensities; and an interpolating unit configured to perform an interpolating process on the processing area image.