发明申请
- 专利标题: SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- 专利标题(中): 半导体器件及制造半导体器件的方法
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申请号: US12636961申请日: 2009-12-14
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公开(公告)号: US20100155740A1公开(公告)日: 2010-06-24
- 发明人: Takako CHINONE , Ji-Hao Liang , Yasuyuki Shibata , Jiro Higashino
- 申请人: Takako CHINONE , Ji-Hao Liang , Yasuyuki Shibata , Jiro Higashino
- 申请人地址: JP Tokyo
- 专利权人: Stanley Electric Co., Ltd.
- 当前专利权人: Stanley Electric Co., Ltd.
- 当前专利权人地址: JP Tokyo
- 优先权: JP2008-327478 20081224
- 主分类号: H01L29/20
- IPC分类号: H01L29/20 ; H01L21/18
摘要:
A cavity-containing layer having a plurality of cavities is formed on a growth substrate by carrying out in alternating fashion a plurality of cycles of a first and second growth steps of growing a group III nitride at growth rates different from each other. The semiconductor epitaxial layer is subsequently formed on the cavity-containing layer, after which a support substrate is bonded to the semiconductor epitaxial layer. The growth substrate is separated from the cavity-containing layer.
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