发明申请
US20100159201A1 ELECTRODE PATTERNING LAYER COMPRISING POLYAMIC ACID OR POLYIMIDE AND ELECTRONIC DEVICE USING THE SAME
有权
包含聚酰胺酸或聚酰亚胺的电极图案层和使用其的电子器件
- 专利标题: ELECTRODE PATTERNING LAYER COMPRISING POLYAMIC ACID OR POLYIMIDE AND ELECTRONIC DEVICE USING THE SAME
- 专利标题(中): 包含聚酰胺酸或聚酰亚胺的电极图案层和使用其的电子器件
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申请号: US11993243申请日: 2006-06-19
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公开(公告)号: US20100159201A1公开(公告)日: 2010-06-24
- 发明人: Shinichi Maeda , Go Ono
- 申请人: Shinichi Maeda , Go Ono
- 申请人地址: JP Chiyoda-ku, Tokyo
- 专利权人: Nissan Chemical Industries, Ltd.
- 当前专利权人: Nissan Chemical Industries, Ltd.
- 当前专利权人地址: JP Chiyoda-ku, Tokyo
- 优先权: JP2005-179210 20050620; JP2005-258620 20050907
- 国际申请: PCT/JP2006/312260 WO 20060619
- 主分类号: B32B3/30
- IPC分类号: B32B3/30 ; G21G1/12
摘要:
Disclosed is an electrode patterning layer for use in the formation of an electrode pattern of any desired shape depending on the difference in wetting property of an electrode-forming solution used, which uses a highly reliable polyimide resin as an electronic material. An electrode patterning layer for use in the formation of an electrode pattern of any desired shape depending on the difference in wetting property of an electrode-forming solution used, electrode patterning layer being formed by irradiating a layer comprising a polyamic acid having the repeated unit represented by the general formula (1) or polyimide produced by dehydration and cyclization of the polyamic acid with ultraviolet lay to form a pattern: (1) wherein A represents a tetravalent organic group and B represents a divalent organic group in which one or more A's and B's may be used, and n is a positive integer, provided that at least one of A's is a tetravalent organic group having a alicyclic structure.