发明申请
US20100163521A1 SYSTEM, METHOD AND APPARATUS FOR FABRICATING A C-APERTURE OR E-ANTENNA PLASMONIC NEAR FIELD SOURCE FOR THERMAL ASSISTED RECORDING APPLICATIONS
有权
用于制造C-APERTURE或E-ANTENNA PLASMONIC近场源的用于热辅助记录应用的系统,方法和装置
- 专利标题: SYSTEM, METHOD AND APPARATUS FOR FABRICATING A C-APERTURE OR E-ANTENNA PLASMONIC NEAR FIELD SOURCE FOR THERMAL ASSISTED RECORDING APPLICATIONS
- 专利标题(中): 用于制造C-APERTURE或E-ANTENNA PLASMONIC近场源的用于热辅助记录应用的系统,方法和装置
-
申请号: US12345715申请日: 2008-12-30
-
公开(公告)号: US20100163521A1公开(公告)日: 2010-07-01
- 发明人: Hamid Balamane , Thomas Dudley Boone, JR. , Jordan Asher Katine , Barry Cushing Stipe
- 申请人: Hamid Balamane , Thomas Dudley Boone, JR. , Jordan Asher Katine , Barry Cushing Stipe
- 申请人地址: NL AZ Amsterdam
- 专利权人: Hitachi Global Storage Technologies Netherlands BV
- 当前专利权人: Hitachi Global Storage Technologies Netherlands BV
- 当前专利权人地址: NL AZ Amsterdam
- 主分类号: B44C1/22
- IPC分类号: B44C1/22 ; B05D5/12
摘要:
A method of fabricating a c-aperture or E-antenna plasmonic near field source for thermal assisted recording applications in hard disk drives is disclosed. A c-aperture or E-antenna is built for recording head applications. The technique employs e-beam lithography, partial reactive ion etching and metal refill to build the c-apertures. This process strategy has the advantage over other techniques in the self-alignment of the c-aperture notch to the c-aperture internal diameter, the small number of process steps required, and the precise and consistent shape of the c-aperture notch itself.
公开/授权文献
信息查询