发明申请
US20100170539A1 Reduction of Entrance and Exit Marks Left by a Substrate-Processing Meniscus
有权
减少由基板加工半月板留下的入口和出口标记
- 专利标题: Reduction of Entrance and Exit Marks Left by a Substrate-Processing Meniscus
- 专利标题(中): 减少由基板加工半月板留下的入口和出口标记
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申请号: US12725422申请日: 2010-03-16
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公开(公告)号: US20100170539A1公开(公告)日: 2010-07-08
- 发明人: Robert O'Donnell , John de Larios , Mike Ravkin
- 申请人: Robert O'Donnell , John de Larios , Mike Ravkin
- 申请人地址: US CA Fremont
- 专利权人: Lam Research Corporation
- 当前专利权人: Lam Research Corporation
- 当前专利权人地址: US CA Fremont
- 主分类号: B08B1/02
- IPC分类号: B08B1/02
摘要:
A proximity head for generating and maintaining a meniscus for processing a substrate is described. The proximity head includes a plurality of meniscus nozzles formed on a face of the proximity head, the nozzles being configured to supply liquid to the meniscus, a plurality of vacuum ports formed on the face of the proximity head, the vacuum ports being arranged to completely surround the plurality of meniscus nozzles, and a plurality of gas nozzles formed on the face of the proximity head, the gas nozzles at least partially surrounding the vacuum ports. The proximity head further includes means for reducing a size and frequency of entrance and/or exit marks at a leading edge and a trailing edge on the substrate by aiding and encouraging liquid from the meniscus to evacuate a gap between the substrate and the carrier.
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