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发明申请
US20100175713A1 METHOD OF CLEANING PLASMA-TREATING APPARATUS, PLASMA-TREATING APPARATUS WHERE THE CLEANING METHOD IS PRACTICED, AND MEMORY MEDIUM MEMORIZING PROGRAM EXECUTING THE CLEANING METHOD 有权
清洁等离子体处理装置的方法，实施清洁方法的等离子体处理装置以及执行清洁方法的记忆介质程序

METHOD OF CLEANING PLASMA-TREATING APPARATUS, PLASMA-TREATING APPARATUS WHERE THE CLEANING METHOD IS PRACTICED, AND MEMORY MEDIUM MEMORIZING PROGRAM EXECUTING THE CLEANING METHOD
摘要：
A method of cleaning a plasma processing apparatus for processing a target in a process container, which is vacuum-evacuatable, using plasma, includes performing a first cleaning process by supplying a cleaning gas into the process container to generate plasma and maintaining the pressure in the process container at a first pressure, and performing a second cleaning process by supplying a cleaning gas into the process container to generate plasma and maintaining the pressure in the process container at a second pressure that is higher than the first pressure. Accordingly, the plasma processing apparatus can be efficiently and rapidly cleaned without damaging at least one of the group consisting of inner surfaces of the process container and members in the process container.
摘要（中）：

一种清洗等离子体处理装置，用于使用等离子体进行真空抽真空处理的处理容器中的目标物的方法包括：通过向处理容器提供清洁气体以产生等离子体并将压力保持在 处理容器，并且通过向处理容器中提供清洁气体以产生等离子体并将处理容器中的压力保持在高于第一压力的第二压力下，执行第二清洁处理。 因此，等离子体处理装置可以被有效且快速地清洁，而不会损坏由处理容器的内表面和处理容器中的构件组成的组中的至少一个。

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