发明申请
- 专利标题： POLISHING PAD MANUFACTURING METHOD
- 专利标题（中）： 抛光垫制造方法
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申请号： US12600201申请日： 2008-05-09
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公开(公告)号： US20100221984A1公开(公告)日： 2010-09-02
- 发明人: Masato Doura , Junji Hirose , Kenji Nakamura , Takeshi Fukuda , Akinori Sato
- 申请人： Masato Doura , Junji Hirose , Kenji Nakamura , Takeshi Fukuda , Akinori Sato
- 申请人地址： JP Osaka-shi
- 专利权人： Toyo tire & Rubber Co., Ltd.
- 当前专利权人： Toyo tire & Rubber Co., Ltd.
- 当前专利权人地址： JP Osaka-shi
- 优先权： JP2007-130535 20070516
- 国际申请： PCT/JP2008/058619 WO 20080509
- 主分类号： B24B1/00
- IPC分类号： B24B1/00 ; B24D11/00 ; B24B37/00
摘要：
A method for manufacturing a polishing pad prevents slurry leaks and provides a pad that can be used to provide high optical detection accuracy. The method for manufacturing a polishing pad includes forming a groove for injecting a light-transmitting region forming material on the back surface of a polishing layer; injecting the light-transmitting region forming material into the groove and curing the material to form a light-transmitting region; and buffing the front surface of the polishing layer to expose the light-transmitting region on the front surface.
公开/授权文献
- US08348724B2 Polishing pad manufacturing method 公开/授权日：2013-01-08
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