发明申请
- 专利标题： LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- 专利标题（中）： LITHOGRAPHIC装置和装置制造方法
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申请号： US12814242申请日： 2010-06-11
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公开(公告)号： US20100245791A1公开(公告)日： 2010-09-30
- 发明人: Johannes Henricus Wilhelmus JACOBS , Igor Petrus Maria Bouchoms , Nicolaas Rudolf Kemper , Nicolaas Ten Kate , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Joost Jeroen Ottens , Martinus Cornelis Maria Verhagen , Yücel Kök , Johannes Van Es , Herman Boom , Fraciscus Johannes Joseph Janssen
- 申请人： Johannes Henricus Wilhelmus JACOBS , Igor Petrus Maria Bouchoms , Nicolaas Rudolf Kemper , Nicolaas Ten Kate , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Joost Jeroen Ottens , Martinus Cornelis Maria Verhagen , Yücel Kök , Johannes Van Es , Herman Boom , Fraciscus Johannes Joseph Janssen
- 主分类号： G03B27/52
- IPC分类号： G03B27/52
摘要：
Methods and apparatus for maintaining the thermal equilibrium of a substrate and an immersion lithographic apparatus are disclosed using or having a timetable comprising information regarding the position, speed and/or acceleration of the substrate; and an evaporation controller and/or condensation controller acting to decrease localized evaporation and/or increase localized condensation in response to the information in the timetable. Evaporation of liquid from the surface of the substrate cools it down, while condensing liquid on its bottom surface heats the substrate locally.