发明申请
US20100276807A1 FABRICATION OF METAL FILM STACKS HAVING IMPROVED BOTTOM CRITICAL DIMENSION
有权
具有改进的底部关键尺寸的金属膜堆的制造
- 专利标题： FABRICATION OF METAL FILM STACKS HAVING IMPROVED BOTTOM CRITICAL DIMENSION
- 专利标题（中）： 具有改进的底部关键尺寸的金属膜堆的制造
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申请号： US12435336申请日： 2009-05-04
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公开(公告)号： US20100276807A1公开(公告)日： 2010-11-04
- 发明人: Han-Hui Hsu , Ta-Hung Yang , Shih-Ping Hong , Ming-Tsung Wu , An-Chi Wei , Ching-Hsiung Li , Kuo-Liang Wei
- 申请人： Han-Hui Hsu , Ta-Hung Yang , Shih-Ping Hong , Ming-Tsung Wu , An-Chi Wei , Ching-Hsiung Li , Kuo-Liang Wei
- 主分类号： H01L23/48
- IPC分类号： H01L23/48 ; H01L21/4763
摘要：
A method of fabricating metal film stacks is described that reduces or eliminates adverse effects of photolithographic misalignments. A bottom critical dimension is increased by removal of a bottom titanium nitride barrier.