Invention Application
- Patent Title: INTEGRATED FLOW CELL WITH SEMICONDUCTOR OXIDE TUBING
- Patent Title (中): 集成流通池与半导体氧化物管
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Application No.: US12237398Application Date: 2008-09-25
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Publication No.: US20100277722A1Publication Date: 2010-11-04
- Inventor: Karsten KRAICZEK , Beno MUELLER , Timothy BEERLING
- Applicant: Karsten KRAICZEK , Beno MUELLER , Timothy BEERLING
- Applicant Address: US CO Loveland
- Assignee: AGILENT TECHNOLOGIES, INC.
- Current Assignee: AGILENT TECHNOLOGIES, INC.
- Current Assignee Address: US CO Loveland
- Main IPC: G01N21/01
- IPC: G01N21/01 ; G01N30/74 ; G01N21/05 ; G01N27/26 ; H01L21/02
Abstract:
An integrated flow cell, the flow cell comprising a semiconductor substrate, and a fluidic conduit having an at least partially transparent semiconductor oxide tubing, wherein the semiconductor oxide tubing is formed with the semiconductor substrate.
Public/Granted literature
- US08213015B2 Integrated flow cell with semiconductor oxide tubing Public/Granted day:2012-07-03
Information query
